Strain distribution and thermal strain relaxation in MOVPE grown hBN films on sapphire substrates
Pith reviewed 2026-05-24 22:43 UTC · model grok-4.3
The pith
Compressive strain in hBN films on sapphire increases with film thickness and can be estimated from their wrinkle morphology.
A machine-rendered reading of the paper's core claim, the machinery that carries it, and where it could break.
Core claim
The authors establish that the overall compressive strain in MOVPE-grown hBN films on sapphire increases with increasing layer thickness. They employ Raman imaging to study the residual strain distribution associated with wrinkling. Temperature-dependent Raman measurements demonstrate that the thermal rate of strain evolution is higher in films of lower thickness. An empirical relation is proposed for estimating the residual strain from the morphology of the films, and partial release of residual strain is achieved by delamination of the films.
What carries the argument
Raman imaging to map the residual strain distribution in wrinkled hBN films from observed peak shifts.
If this is right
- Thicker films accumulate higher compressive strain and therefore need stronger interventions for relaxation.
- The empirical relation allows residual strain to be estimated directly from visible film morphology without full spectroscopic mapping.
- Thinner films relax strain more readily under thermal treatment, accounting for observed differences in as-grown samples.
- Delamination offers a practical route to partial strain relief after growth.
Where Pith is reading between the lines
- Growth recipes could be tuned using the thickness-strain trend to limit wrinkling when thicker films are required for device layers.
- Similar morphology-based strain estimates might be tested on hBN or related 2D films grown by other techniques on sapphire.
- Combining Raman data with direct lattice measurements could test whether the empirical relation holds beyond the studied samples.
Load-bearing premise
Raman peak shifts correspond directly and exclusively to biaxial compressive strain without contributions from defects, doping or substrate interactions.
What would settle it
X-ray diffraction measurements of lattice constants across films of different thicknesses that show no increase in compressive strain with thickness.
Figures
read the original abstract
Recently, hexagonal boron nitride (hBN) layers have generated a lot of interest as ideal substrates for 2D stacked devices. Sapphire-supported thin hBN films of different thicknesses are grown using metalorganic vapour phase epitaxy technique by following a flow modulation scheme. Though these films of relatively large size are potential candidates to be employed in designing real devices, they exhibit wrinkling. The formation of wrinkles is a key signature of strain distribution in a film. Raman imaging has been utilized to study the residual strain distribution in these wrinkled hBN films. An increase in the overall compressive strain in the films with an increase in the layer thickness has been observed. To find whether the residual lattice strain in the films can be removed by a thermal treatment, temperature dependent Raman measurements of these films are carried out. The study demonstrates that the thermal rate of strain evolution is higher in the films of lower thickness than in the thicker films. This observation further provides a possible explanation for the variation of strain in the as-grown films. An empirical relation has been proposed for estimating the residual strain from the morphology of the films. We have also shown that the residual strain can be partially released by the delamination of the films.
Editorial analysis
A structured set of objections, weighed in public.
Referee Report
Summary. The manuscript examines MOVPE-grown hBN films on sapphire using a flow-modulation scheme. Raman imaging is used to map residual strain in wrinkled films of varying thickness, revealing an increase in overall compressive strain with thickness. Temperature-dependent Raman measurements assess thermal relaxation, showing faster strain evolution in thinner films. An empirical relation linking residual strain to film morphology is proposed, and partial strain release via delamination is demonstrated.
Significance. If the Raman-to-strain conversion is shown to be free of significant confounders, the thickness-dependent trend and empirical morphology-strain relation would provide a practical, experimentally grounded approach to strain assessment in scalable hBN films for 2D devices. The differential thermal relaxation rates offer a plausible mechanistic link between growth conditions and final strain state.
major comments (2)
- [Abstract / Raman imaging results] Abstract and Raman imaging analysis: the central claims of increasing compressive strain with thickness and the empirical morphology-strain relation rest on direct conversion of E2g peak shifts to biaxial strain. No calibration details, reference unstrained frequency, peak-fitting procedure, or controls for confounding shifts (defects, doping, interfacial bonding) are described; if any of these scale with thickness or wrinkle density, both the trend and the empirical formula lose uniqueness.
- [Temperature dependent Raman measurements] Temperature-dependent Raman section: the reported higher thermal rate of strain evolution in thinner films is used to explain the as-grown thickness dependence, yet the abstract and described analysis provide neither quantitative rates, error bars, nor the number of films or measurement points per thickness; without these, the differential-relaxation explanation cannot be evaluated.
minor comments (2)
- [Empirical relation proposal] The empirical relation is stated to contain free coefficients; the manuscript should explicitly list the fitted parameters and the data used for the fit so that the relation can be reproduced or tested independently.
- [Abstract] Abstract lacks any mention of sample statistics, error bars on strain values, or the number of films examined per thickness; these should be added for transparency even if they appear in the main text.
Simulated Author's Rebuttal
We thank the referee for the constructive feedback on our manuscript. We have carefully considered the comments and will revise the manuscript to address the concerns raised regarding the Raman analysis details and the quantitative aspects of the temperature-dependent measurements.
read point-by-point responses
-
Referee: [Abstract / Raman imaging results] Abstract and Raman imaging analysis: the central claims of increasing compressive strain with thickness and the empirical morphology-strain relation rest on direct conversion of E2g peak shifts to biaxial strain. No calibration details, reference unstrained frequency, peak-fitting procedure, or controls for confounding shifts (defects, doping, interfacial bonding) are described; if any of these scale with thickness or wrinkle density, both the trend and the empirical formula lose uniqueness.
Authors: We thank the referee for highlighting this important point. The manuscript does rely on the standard Raman shift to strain conversion for hBN, using literature values for the biaxial strain coefficient. However, we agree that explicit details are needed. In the revised manuscript, we will add: (1) the reference unstrained E2g frequency used (typically 1365 cm⁻¹ for bulk hBN), (2) description of the Lorentzian peak fitting procedure, (3) calibration reference if any, and (4) discussion of potential confounders with arguments why they do not dominate the observed thickness trend (e.g., the correlation with morphology which is strain-related). If additional controls are possible from existing data, they will be included. This will strengthen the uniqueness of the claims. revision: yes
-
Referee: [Temperature dependent Raman measurements] Temperature-dependent Raman section: the reported higher thermal rate of strain evolution in thinner films is used to explain the as-grown thickness dependence, yet the abstract and described analysis provide neither quantitative rates, error bars, nor the number of films or measurement points per thickness; without these, the differential-relaxation explanation cannot be evaluated.
Authors: We agree that quantitative details are essential for evaluating the claims. The original manuscript presented the observation qualitatively. In the revision, we will include the calculated thermal rates of strain evolution (in cm⁻¹/°C or equivalent strain units) with error bars, specify the number of films studied per thickness category, and the number of measurement points or cycles per film. This will allow proper assessment of the differential relaxation rates and their link to the as-grown strain. revision: yes
Circularity Check
No circularity: experimental measurements and data-derived empirical relation
full rationale
The paper reports direct experimental observations via Raman imaging and temperature-dependent measurements on MOVPE-grown hBN films. The claimed increase in compressive strain with thickness and the proposed empirical morphology-strain relation are presented as outcomes of data analysis rather than any derivation, prediction, or first-principles result that reduces to its own inputs by construction. No self-citations, ansatzes, or fitted parameters are invoked as load-bearing steps in a theoretical chain. The work is self-contained against external benchmarks with no evidence of the enumerated circularity patterns.
Axiom & Free-Parameter Ledger
free parameters (1)
- coefficients in empirical morphology-strain relation
axioms (1)
- domain assumption Raman peak position shift is a linear proxy for biaxial compressive strain in hBN
Reference graph
Works this paper leans on
-
[1]
The Raman spectrum of bulk hBN is shown in the top for reference. Here we would like to mention that we did not observe the E 2g low mode at 52 cm -1, most probably, due to its low intensity in our non-resonant and low power experimental conditions. The spatial non -uniform and wrinkled surface topography of the films, as shown in Figure 1, indicates that...
-
[2]
L. H. Li and Y. Chen, Atomically thin boron nitride: Unique properties and applications, Adv. Funct. Mater. 26 2594 (2016)
work page 2016
- [3]
-
[4]
S. Park, C. Park and G. Kim, Interlayer coupling enhancement in graphene/hexagonal boron nitride heterostructures by intercalated defects or vacancies, J. Chem. Phys. 140, 134706 (2014)
work page 2014
-
[5]
J. Eichler and C. Lesniak, Boron nitride (BN) and BN composites for high-temperature applications, J. Eur. Ceram. Soc. 28, 1105 (2008)
work page 2008
-
[6]
N. Kostoglou, K. Polychronopoulou and C. Rebholz, Thermal and Chemical Stabi lity of Hexagonal Boron Nitride (h-BN) Nanoplatelets, Vacuum, 112, 42 (2015)
work page 2015
- [7]
-
[8]
V. Shautsova, A.M. Gilbertson, N.C.G. Black, S.A. Maier, L.F. Cohen, Hexagonal boron nitride assisted transfer and encapsulation of large area CVD graphene, Sci. Rep. 6, 30210 (2016)
work page 2016
-
[9]
J.I.J. Wang, Y. Yang, Y.A. Chen, K. Watanabe, T. Taniguchi, H.O.H. Churchill and P. Jarillo-Herrero, Electronic transport of encapsulated graphene and WSe 2 devices fabricated by pick-up of prepatterned HBN, Nano Lett. 15, 1898 (2015)
work page 2015
-
[10]
G. Cassabois, P. Valvin and B. Gil, Hexagonal boron nitride is an indirect bandgap semiconductor, Nat. Photonics 10, 262 (2016)
work page 2016
- [11]
-
[12]
R. Page, J. Casamento, Y. Cho, S. Rouvimov,H.G. Xing and D. Jena, Rotationally aligned hexagonal boron nitride on sapphire byhigh -temperature molecular beam epitaxy, Phys. Rev. Mater 3, 064001 (2019)
work page 2019
-
[13]
A.R. Shugurov and A.V. Panin Mechanisms of periodic deformation of the film - substrate system under compressive stress Phys. Mesomech. 13 79 (2010)
work page 2010
-
[14]
E. Cerda and L. Mahadevan, Geometry and physics of wrinkling, Phys. Rev. Lett. 90 , 074302 (2003)
work page 2003
-
[15]
T.M.G. Mohiuddin, A. Lombardo, R.R. Nair, A. Bonetti, G. Savini, R. Jalil, N. Bonini, D. M. Basko, C. Galiotis, N. Marzari, K.S. Novoselov, A.K. Geim and A.C. Ferrari, Uniaxial strain in graphene by Raman spectroscopy: G peak Splitting, Grüneisen parameters, and sample orientation, Phys. Rev. B 79, 205433 (2009)
work page 2009
-
[16]
N.S. Mueller, S. Heeg, M.P. Alvarez, P. Kusch, S. Wasserroth, N Clark, F. Schedin, J. Parthenios, K. Papagelis, C. Galiotis, M. Kalbáč, A. Vijayaraghavan, U. Huebner, R. Gorbachev, O. Frank and S. Reich S Evaluating arbitrary strain config urations and doping in graphene with Raman spectroscopy 2D Mater. 5 015016 (2018)
work page 2018
-
[17]
Z.H. Ni, T. Yu, Y. Wang, Y.P. Feng and Z.X. Shen, Uniaxial strain on graphene : Raman, ACS Nano 2, 2311 (2008)
work page 2008
- [18]
-
[19]
C.R. Zhu, G. Wang, B.L. Liu, X. Marie, X.F. Qiao, X. Zhang, X.X. Wu, H. Fan, P.H. Tan, T. Amand and B. Urbaszek, Strain tuning of optical emission energy and polarization in monolayer and bilayer MoS2, Phys. Rev. B 88, 121301(R) (2013)
work page 2013
-
[20]
Z. Ni, Y. Wa ng, T. Yu and Z. Shen, Raman spectroscopy and imaging of graphene, Nano Res. 1, 273 (2008)
work page 2008
-
[21]
A.C. Ferrari, J.C. Meyer, V. Scardaci,C. Casiraghi, M. Lazzeri, F. Mauri, S. Piscanec, D. Jiang, K.S. Novoselov, S. Roth and A.K. Geim, Raman spectrum of g raphene and graphene layers, Phys. Rev. Lett. 97, 187401 (2006)
work page 2006
-
[22]
R. Cuscó B.Gil, G. Cassabois and L. Artús, Temperature dependence of Raman-active phonons and anharmonic interactions in layered hexagonal BN, Phys. Rev. B , 94, 155435 (2016)
work page 2016
-
[23]
C. Androulidakis, E.N. Koukaras, M. Poss, K. Papagelis, C. Galiotis and S.Tawfick, Strained hexagonal boron nitride: Phonon shift and Grüneisen parameter, Phys. Rev. B 97, 241414 (2018)
work page 2018
-
[24]
I. Stenger, L. Schué,M. Boukhicha, B. Berini, B. Plaçais, A . Loiseau and J. Barjon, Low frequency Raman spectroscopy of few -atomic-layer thick HBN crystals. 2D Mater. 4, 031003 (2017)
work page 2017
-
[25]
Z. Li, I.A. Kinloch, R.J. Young, K.S. Novoselov,G. Anagnostopoulos, J. Parthenios, C. Galiotis, K. Papagelis, C.Y. ; Lu and L. Britnell, Deformation of wrinkled graphene, ACS Nano 9, 3917 (2015)
work page 2015
-
[26]
A.F. Gumenjuk, S.Y. Kutovyi and M.O. Grebenovych, Study of Trapping Centers in Undoped Al 2O3 Crystals using thermoluminescence methods, Funct. Mater. 12, 72 (2005)
work page 2005
-
[27]
Q. Wang, Q. Zhang, X. Zhao, X. Luo,C.P.Y. Wong, J. Wang, D. Wan, T.Venkatesan, S.J. Pennycook, K.P. Loh, G. Eda and A.T.S. Wee, Photoluminescence upconversion by defects in hexagonal boron nitride, Nano Lett. 18, 6898 (2018)
work page 2018
-
[28]
Pease, An X-Ray Study of boron nitride, Acta Crystallogr
R.S. Pease, An X-Ray Study of boron nitride, Acta Crystallogr. 5, 356 (1952)
work page 1952
-
[29]
W. Paszkowicz, J.B. Pelka, M. Knapp, T. Szyszko and S. Podsiadlo, Lattice parameters and anisotropic thermal expansion of hexagonal boron nitride in the 10 - 297.5 K temperature range, Appl. Phys. A Mater. Sci. Process. 75, 431 (2002)
work page 2002
-
[30]
W. Pan, J. Xiao, J. Zhu, C. Yu, G. Zhang, Z. Ni, K. Watanabe, T. Taniguchi, Y. Shi and X. Wang, Biaxial compressive strain engineering in graphene/boron nitride heterostructures, Sci. Rep. 2, 893 (2012)
work page 2012
-
[31]
Q. Cai, D. Scullion,A. Falin, K. Watanabe, T. Taniguchi, Y. Chen, E.J.G. Santos and L.H. Li, Raman signature and phonon dispersion of atomically thin boron nitride, Nanoscale 9, 3059 (2017)
work page 2017
- [32]
-
[33]
C. Thomsen, S. Reich and P. Ordejón, Ab initio determination of the phonon deformation potentials of graphene, Phys Rev. B 65 073403 (2002)
work page 2002
-
[34]
M. Balkanski, R.F. Wallis and E. Haro, Anharmonic effects in light scattering due to optical phonons in silicon, Phys. Rev. B 28, 1928 (1983)
work page 1928
discussion (0)
Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.