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Soft x-ray irradiation induced metallization of layered TiNCl

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arxiv 2010.01846 v1 pith:OCZA26LB submitted 2020-10-05 cond-mat.mtrl-sci cond-mat.str-el

Noriyuki Kataoka , Masashi Tanaka , Wataru Hosoda , Takumi Taniguchi , Shin-ichi Fujimori , Takanori Wakita , Yuji Muraoka , Takayoshi Yokoya This is my paper · ORCID
classification cond-mat.mtrl-scicond-mat.str-el
keywords softtinclx-rayfermiirradiationlayeredmetallizationspectroscopy
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We have performed soft x-ray spectroscopy in order to study the photoirradiation time dependence of the valence band structure and chemical states of layered transition metal nitride chloride TiNCl. Under the soft x-ray irradiation, the intensities of the states near the Fermi level (EF) and the Ti3+ component increased, while the Cl 2p intensity decreased. Ti 2p-3d resonance photoemission spectroscopy confirmed a distinctive Fermi edge with Ti 3d character. These results indicate the photo-induced metallization originates from deintercalation due to Cl desorption, and thus provide a new carrier doping method that controls the conducting properties of TiNCl.

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