pith. sign in

arxiv: 2201.06862 · v1 · pith:6B72HBJWnew · submitted 2022-01-18 · ❄️ cond-mat.mes-hall · cond-mat.str-el

A high-mobility hole bilayer in a germanium double quantum well

classification ❄️ cond-mat.mes-hall cond-mat.str-el
keywords bilayerdoubleholequantumtimeswellchannelsdensity
0
0 comments X
read the original abstract

We design, fabricate, and study a hole bilayer in a strained germanium double quantum well. Magnetotransport characterisation of double quantum well field-effect transistors as a function of gate voltage reveals the population of two hole channels with a high combined mobility of 3.34$\times$10$^5$ cm$^2$/Vs and a low percolation density of 2.38$\times$10$^{10}$ cm$^{-2}$. We resolve the individual population of the channels from the interference patterns of the Landau fan diagram. At a density of 2.0$\times$10$^{11}$ cm$^{-2}$ the system is in resonance and we observe an anti-crossing of the first two bilayer subbands characterized by a symmetric-antisymmetric gap of $\sim$0.69 meV, in agreement with Schr\"odinger-Poisson simulations.

This paper has not been read by Pith yet.

discussion (0)

Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.

Forward citations

Cited by 2 Pith papers

Reviewed papers in the Pith corpus that reference this work. Sorted by Pith novelty score.

  1. Tailoring Germanium Heterostructures for Quantum Devices with Machine Learning

    cond-mat.mes-hall 2026-04 unverdicted novelty 6.0

    Localized strained silicon spikes in unstrained Ge channels, optimized via multi-objective Bayesian optimization, enhance spin-orbit interaction by up to three orders of magnitude and improve quantum-dot spin qubit qu...

  2. Tailoring Germanium Heterostructures for Quantum Devices with Machine Learning

    cond-mat.mes-hall 2026-04 unverdicted novelty 6.0

    Multi-objective Bayesian optimization of Si-spike-enriched Ge heterostructures predicts up to 1000x stronger spin-orbit interaction and 100x better spin-qubit quality factors than state-of-the-art Ge/SiGe wells.