Quantum transport properties of tantalum-oxide resistive switching filaments

Filamentary resistive switching devices are not only considered as promising building blocks for brain-inspired computing architectures, but they also realize an unprecedented operation regime, where the active device volume reaches truly atomic dimensions. Such atomic-sized resistive switching filaments represent the quantum transport regime, where the transmission eigenvalues of the conductance channels are considered as a specific device fingerprint. Here, we gain insight into the quantum transmission properties of close-to-atomic-sized resistive switching filaments formed across an insulating Ta$_2$O$_5$ layer through superconducting subgap spectroscopy. This method reveals the transmission density function of the open conduction channels contributing to the device conductance. Our analysis confirms the formation of truly atomic-sized filaments composed of 3-8 Ta atoms at their narrowest cross-section. We find that this diameter remains unchanged upon resistive switching. Instead, the switching is governed by the redistribution of oxygen vacancies within the filamentary volume. The set/reset process results in the reduction/formation of an extended barrier at the bottleneck of the filament which enhances/reduces the transmission of the highly open conduction channels.