pith. machine review for the scientific record. sign in

arxiv: cond-mat/0405491 · v1 · submitted 2004-05-21 · ❄️ cond-mat.mtrl-sci

Barrier formation at metal/organic interfaces: dipole formation and the Charge Neutrality Level

classification ❄️ cond-mat.mtrl-sci
keywords formationorganicbarrierchargeinducedmetalstatescalculate
0
0 comments X
read the original abstract

The barrier formation for metal/organic semiconductor interfaces is analyzed within the Induced Density of Interface States (IDIS) model. Using weak chemisorption theory, we calculate the induced density of states in the organic energy gap and show that it is high enough to control the barrier formation. We calculate the Charge Neutrality Levels of several organic molecules (PTCDA, PTCBI and CBP) and the interface Fermi level for their contact with a Au(111) surface. We find an excellent agreement with the experimental evidence and conclude that the barrier formation is due to the charge transfer between the metal and the states induced in the organic energy gap.

This paper has not been read by Pith yet.

discussion (0)

Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.