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Strain Modulation of Graphene by Nanoscale Substrate Curvatures: A Molecular View

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arxiv 1803.01502 v1 pith:IYSNTRXJ submitted 2018-03-05 cond-mat.mes-hall

classification cond-mat.mes-hall
keywords straingrapheneengineeringnanospheresimportantlargermolecularsmaller
verification ladder T0 review T1 audit T2 compute T3 formal
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Spatially nonuniform strain is important for engineering the pseudomagnetic field and band structure of graphene. Despite the wide interest in strain engineering, there is still a lack of control on device-compatible strain patterns due to the limited understanding of the structure-strain relationship. Here, we study the effect of substrate corrugation and curvature on the strain profiles of graphene via combined experimental and theoretical studies of a model system: graphene on closely packed SiO2 nanospheres with different diameters (20-200 nm). Experimentally, via quantitative Raman analysis, we observe partial adhesion and wrinkle features and find that smaller nanospheres induce larger tensile strain in graphene, theoretically, molecular dynamics simulations confirm the same microscopic structure and size dependence of strain and reveal that a larger strain is caused by a stronger, inhomogeneous interaction force between smaller nanospheres and graphene. This molecular-level understanding of the strain mechanism is important for strain engineering of graphene and other two-dimensional materials.

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