Significantly increased magnetic anisotropy in Co nano-columnar multilayer structure via a unique sequential oblique-normal deposition approach

Oblique/normal sequential deposition technique is used to create Co based unique multilayer structure [Co-oblique(4.4nm)/Co-normal (4.2 nm)]x10, where each Co-oblique layer is deposited at an oblique angle of 75deg, to induce large in-plane uniaxial magnetic anisotropy (UMA). Compared to the previous ripple, stress and oblique angle deposition (OAD) related studies on Cobalt in literature, one-order higher UMA with the easy axis of magnetization along the projection of the tilted nano-columns in the multilayer plane is observed. The multilayer retains magnetic anisotropy even after annealing at 450C. The in-plane UMA in this multilayer is found to be the combination of shape, and magneto-crystalline anisotropy (MCA) confirmed by the temperature-dependent grazing incidence small angle X-ray scattering (GISAXS), in situ reflection high energy electron diffraction (RHEED) and grazing incidence X-ray diffraction (GIXRD) measurements. The crystalline texturing of hcp Co in the multilayer minimizes spin-orbit coupling energy along the column direction, which couples with the shape anisotropy energies and results in preferential orientation of the easy magnetic axis along the projection of the columns in the multilayer plane. Reduction in UMA after annealing is attributed to diffusion/merging of columns and annihilating crystallographic texturing. The obtained one-order high UMA demonstrates the potential application of the unique structure engineering technique, which may have far-reaching advantages in magnetic thin films/multilayers and spintronic devices.