Canalization-based super-resolution imaging using a single van der Waals layer

Canalization is an optical phenomenon that enables unidirectional propagation of light in a natural way, i.e., without the need for predefined waveguiding designs. Predicted years ago, it was recently demonstrated using highly confined phonon polaritons (PhPs) in twisted layers of the van der Waals (vdW) crystal alpha-MoO3, offering unprecedented possibilities for controlling light-matter interactions at the nanoscale. However, despite this finding, applications based on polariton canalization have remained elusive so far, which can be explained by the complex sample fabrication of twisted stacks. In this work, we introduce a novel canalization phenomenon, arising in a single vdW thin layer (alpha-MoO3) when it is interfaced with a substrate exhibiting a given negative permittivity, that allows us to demonstrate a proof-of-concept application based on polariton canalization: super-resolution (up to ~{\lambda}0/220) nanoimaging. Importantly, we find that canalization-based imaging transcends conventional projection constraints, allowing the super-resolution images to be obtained at any desired location in the image plane. This versatility stems from the synergetic manipulation of three distinct parameters: incident frequency, rotation angle of the thin vdW layer, and thickness. These results provide valuable insights into the fundamental properties of canalization and constitute a seminal step towards multifaceted photonic applications, encompassing imaging, data transmission, and ultra-compact photonic integration.