REVIEW 2 major objections 6 minor 44 references
Modeling the variability of memristive devices with hexagonal boron nitride as dielectric
T0 review · 2 major / 6 minor · reviewed 2026-08-12 · deepseek-v4-flash
Pith's one-line read The reset voltage of Au/Ti/h-BN/Au memristors is autocorrelated across cycles, so an ARIMA model can predict each cycle's value from the previous one.
desk verdict Useful h-BN variability data, but the charge-flux V_reset2 measures post-rupture current collapse, not reset onset, so the three-way CV comparison is partially apples-to-oranges. read the letter →
The pith
A machine-rendered reading of the paper's core claim, the machinery that carries it, and where it could break.
The reading
What carries the argument
The argument is carried by three extraction methods for $V_{reset}$; by the charge-flux transformation $Q(t)=\int_0^t i(t')\,dt'$, $\phi(t)=\int_0^t v(t')\,dt'$, in which the reset point is the first null of $dQ/d\phi$; by the autoregressive integrated moving-average (ARIMA) time-series model that relates $V_{reset,t}$ to $V_{reset,t-1}$ and the previous residual; and by a circuit-breaker simulator whose breakers switch between $R_{on}=300\,\Omega$ and $R_{off}=10^8\,\Omega$ with threshold voltages $V_{on}=0.17$ V and $V_{off}=0.182$ V. The charge-flux domain removes measurement noise by integration and makes the $Q$-$\phi$ curves fit with only three parameters, while the ARIMA model converts the observed autocorrelation into a predictive rule and the circuit-breaker network links the electrical curves to the spatial formation and rupture of conductive nanofilaments.
What would settle it
Measure, over the same set of switching cycles, the voltage at the onset of the abrupt current decrease during reset and the voltage where $dQ/d\phi$ first becomes null; if the null point consistently occurs after the current has already dropped by more than half of its low-resistance value, then $V_{reset2}$ is a post-rupture marker and the coefficient-of-variance comparison across the three methods does not describe the same transition.
Extended reading notes
Core claim
The central claim is that, in Au/Ti/h-BN/Au memristive devices, the cycle-to-cycle dispersion of the reset voltage is a real, method-dependent quantity and that the reset process is memory-correlated while the set process is not. Concretely, the coefficient of variance of $V_{reset}$ is 40% when read at the maximum of the LRS current, 28% when read at the first point where $dQ/d\phi=0$ in the charge-flux plane, and 32% when read at the minimum of the current derivative. The set voltage shows no autocorrelation, whereas the reset voltage does, and the paper builds an ARIMA model of the form $V_{reset,t} = a\,V_{reset,t-1} + b\,\epsilon_{t-1} + c$ that uses the previous cycle's reset voltage and previous modeling error to compute the current one. A two-level circuit-breaker network with quantum-point-contact conduction reproduces the measured set and reset I-V curves, locating the abrupt reset in the rupture of one or several rows of the percolation path. The paper also fits the experimental $Q$-$\phi$ curves with a three-parameter compact expression, so the whole switching cycle can be represented statistically for circuit simulation.
Load-bearing premise
The argument assumes that the point where the device current collapses to near zero marks the reset transition itself, rather than the end of the reset process; if that point is post-rupture, then the 28% coefficient of variance obtained from the charge-flux method is measuring a different physical quantity than the other two methods, and the comparison that anchors the variability analysis is not apples-to-apples.
Editorial extensions
If this is right
- Cycle-to-cycle reset variability in h-BN memristors can be captured by a one-lag ARIMA model, so statistical compact models should include a reset-voltage memory term rather than drawing each value independently.
- Because $V_{set}$ shows no autocorrelation, set events can be modeled as independent draws in the same statistical framework.
- Reported variability figures for reset voltage are not intrinsic constants; the coefficient of variance ranges from 28% to 40% depending on extraction method, so comparisons between devices or studies should quote the extraction technique.
- The three-parameter charge-flux model fits experimental $Q$-$\phi$ curves and provides statistically distributed parameters suitable for circuit-level simulation.
- The two-level circuit-breaker simulator reproduces the measured I-V curves and shows that reset corresponds to the rupture of one or several rows of the percolation path, consistent with the abrupt current drop.
Reading between the lines
- The paper does not discuss it, but if reset voltages are autocorrelated, h-BN-based true random number generators that sample reset events should test for and remove this serial dependence before treating the values as entropy.
- The contrast between autocorrelated reset and independent set suggests that filament rupture retains memory of the previous filament geometry while filament formation does not; this could be tested by comparing ARIMA coefficients across h-BN thicknesses and electrode metals.
- A practical extension would be to track the fitted $n$ parameter of the charge-flux model over device lifetime, since the paper shows it correlates with $Q_{reset}$ and $\phi_{reset}$, to see whether it drifts with cycling or device degradation.
- The charge-flux extraction method could be applied to other noisy two-dimensional-material memristors to test whether the observed ordering of coefficients of variance (maximum-current method highest, charge-flux method lowest) is a general property or specific to this stack.
Editorial analysis
A structured set of objections, weighed in public.
Referee Report
Summary. This paper studies cycle-to-cycle variability in Au/Ti/h-BN/Au memristive devices. The authors extract the reset voltage by three methods: (i) the voltage at maximum LRS current, (ii) the voltage at which the charge derivative with respect to flux is null in the charge-flux (Q–φ) domain, and (iii) the voltage at which the current derivative is minimum. They report coefficients of variation CV1=40%, CV2=28%, CV3=32% and cumulative distribution functions for the extracted parameters. They fit the Q–φ curves with a compact model (Eq. (3)) and analyze the cycle-to-cycle series of V_reset with an ARIMA model, concluding that the reset voltage is autocorrelated while the set voltage is not. Finally, they use a 20×20 circuit-breaker network simulator with thermal switching to reproduce one set/reset I-V cycle and illustrate conductive-filament formation and rupture with network snapshots.
Significance. The paper addresses an underexplored topic: quantitative variability assessment and modeling of h-BN based memristors. Its strengths include the use of raw experimental I-V data for the main variability statistics, the explicit comparison of three extraction criteria, and the integration of charge-flux, time-series, and percolation-network analyses. If the concerns about the reset-voltage definitions and the ARIMA validation are resolved, the work would provide a useful methodology reference for a community that has few such parameter-extraction studies in 2D-material memristors. The reported CV values and the claim that reset voltages carry a serial correlation are the type of falsifiable quantitative statements that are valuable. At present, however, the load-bearing statistics CV2 and the ARIMA claim are not sufficiently supported.
major comments (2)
- [Section IV, Fig. 2, Eqs. (1)-(2)] The definition of V_reset2 as the first point where dQ/dφ = 0 is not a reset-onset estimate. Since Q = ∫ i dt and φ = ∫ v dt, dQ/dφ = i(t)/v(t); the null condition is reached when the device current has already fallen to near zero, i.e., after the conductive filament has ruptured. The paper itself states that this point corresponds to 'the device current drops off to negligible values.' Therefore V_reset2 is a reset-completion (current-collapse) voltage, while V_reset1 (maximum LRS current) and V_reset3 (minimum current derivative) target the onset or steepest resistive drop. The comparison CV1=40%, CV2=28%, CV3=32% is thus not a comparison of three estimators of the same physical quantity. The null-current point is also sensitive to the measurement noise floor and to the stop voltage of the sweep, which can truncate the upper tail of V_reset2 and lower its dispersion. Please either provide evidence that the null-current point coincides with the onset of filament rupture, or redefine V_reset2 explicitly as a reset-completion voltage and avoid a direct CV comparison with the other two methods.
- [Section IV, Eq. (4), Fig. 5] The ARIMA analysis is not sufficiently validated. The manuscript does not report the estimated coefficients, standard errors, or residual diagnostics (e.g., Ljung-Box tests) for Eq. (4), and Fig. 5 appears to plot the model's fitted values against the same V_reset series used to estimate the model. On this evidence, the claim that the reset voltage series has a predictive 'memory' structure is not established; a fitted ARIMA model can track an estimation sample even if it has no out-of-sample skill. Please add a proper model-identification table, residual diagnostics, and an out-of-sample or cross-validated evaluation. In addition, the statement that V_set has no autocorrelation and therefore 'no time series model can be extracted' is too strong; a white-noise series is still described by a constant-mean model.
minor comments (6)
- [Section IV, Fig. 2] Several typographical errors should be corrected, including 'derivate' instead of 'derivative'; the numerical differentiation scheme used to compute dI/dV should also be specified (e.g., smoothing window or filter).
- [Eq. (3)] Equation (3) is cited as a compact expression, but its explicit mathematical form does not appear in the manuscript text; please ensure the equation is rendered.
- [Fig. 1(i) and Fig. 3] The CDF figures do not state the number of cycles and whether the data come from a single device or multiple devices; this information is necessary to interpret the reported CV values.
- [Fig. 5] The caption of Fig. 5 does not specify which of the three reset-voltage extraction methods is plotted; please state whether the series corresponds to V_reset1, V_reset2, or V_reset3.
- [Fig. 6-8] Only one I-V cycle is compared between the circuit-breaker simulation and experiment; a quantitative error measure (e.g., normalized RMS error) and, ideally, a small ensemble of simulated cycles would make the 'reasonably good' fit claim testable.
- [Section IV] The statement that the charge-flux transformation 'minimizes the effects of electric noise' is plausible but unquantified; a noise-injection or repeatability test would support this claim.
Circularity Check
Partial circularity: V_reset2 is defined as the post-rupture current-collapse point, and the ARIMA 'prediction' is an in-sample fit; the core ACF-based memory finding remains independent.
-
fitted input called prediction
[Section IV, Eq. (4), Fig. 5; Conclusions]
"See that the general trend of the data series can be predicted with the model (Fig. 5), as it is expected for a model based on this theory [15, 27]. ... where Vreset_t is the modeled reset voltage in the current cycle of an RS series, and Vreset_t-1 is the modeled reset voltage lagged one cycle (i.e., the reset voltage value of the previous RS cycles), εt-1 is the error (the residual in the time series argot) made in the modeling process in the previous cycle; i.e, the experimental minus the modeled values [15, 41, 42]."
The ARIMA model is identified and estimated from the same V_reset series that is then plotted as 'modeled' in Fig. 5. No training/test split or out-of-sample forecasting is described. Since Eq. (4) uses the previous observed V_reset and the previous residual as regressors, the one-step fitted series is algebraically tied to the data used to estimate its coefficients. The blue 'predicted' curve is therefore an in-sample reconstruction, not an independent forecast. The claim that the general trend 'can be predicted' is forced by construction, although the ACF/PACF evidence for autocorrelation is a separate, data-grounded result.
-
self definitional
[Section IV, Fig. 2(a), 2(c)-2(e), Eqs. (1)-(2)]
"V_reset2 is established at the first point where the charge derivative with respect to the flux is null. ... taking into account (1) and (2), this means that the device current drops off to negligible values at the point (Q_reset, φ_reset). ... See that φ_reset shows indirectly the voltage needed to reach the reset point where the conductive nanofilament is destroyed."
From Eqs. (1)-(2), dQ/dφ = (dQ/dt)/(dφ/dt) = i(t)/v(t), so a null dQ/dφ is equivalent to i(t)=0 for v(t)≠0. The paper's own wording states this is where the current drops to negligible values. In a bipolar reset sweep, the current is in LRS before the transition and collapses only after the filament has ruptured, so this null-derivative point marks the end of the reset transition, not its onset or trigger.
full rationale
The paper is largely data-grounded: CV1 and CV3 are conventional extraction points from raw I-V measurements, and the ACF/PACF autocorrelation analysis is an independent statistical characterization of the measured V_reset series. However, two steps reduce by construction. First, V_reset2 is defined as the point where dQ/dφ=0, which by Eqs. (1)-(2) is the point where the current is negligible, i.e., after the reset transition; interpreting it as the reset voltage makes the low CV2 partly an artifact of definition rather than a measurement of the same physical event as CV1 and CV3. Second, the ARIMA model is fitted to the same V_reset series that is then shown as 'modeled' and said to be 'predicted,' without any out-of-sample validation; that prediction is an in-sample fit. The charge-flux model of Eq. (3) and the circuit-breaker simulation are transparently fitted to the data and are not framed as predictions, so they do not add circularity. Overall, the central memory-effect claim has independent support, but the paper contains one self-definitional extraction and one in-sample prediction presented as prediction, warranting a partial-circularity score of 6.
Assumptions & free parameters
free parameters (7)
- Charge-flux model exponent n =
0.6 to 1.3 per cycle
- Circuit-breaker R_on =
300 ohm
- Circuit-breaker R_off =
1e8 ohm
- Circuit-breaker V_on =
0.17 V
- Circuit-breaker V_off =
0.182 V
- ARIMA regression coefficients =
not reported
- Initial fraction of circuit breakers in LRS =
not stated
assumptions (4)
- domain assumption dQ/dphi = 0 defines the reset point.
- domain assumption The V_reset series is stationary after differencing and adequately described by the ARIMA model in Eq. (4).
- ad hoc to paper A 20x20 grid of two-level circuit breakers with thermal-driven switching can reproduce h-BN filament formation and rupture.
- domain assumption Approximately 17 Ti atoms in a straight line can represent a conductive filament across a 6 nm h-BN stack.
Cite this review
Pith. "Pith review of Modeling the variability of memristive devices with hexagonal boron nitride as dielectric." pith.science (2026). https://pith.science/paper/CDT6QSDR
@misc{pith2026241113872,
author = {Pith},
title = {Pith review of: Modeling the variability of memristive devices with hexagonal boron nitride as dielectric},
year = {2026},
howpublished = {\url{https://pith.science/paper/CDT6QSDR}},
note = {Machine review of arXiv:2411.13872}
}
read the original abstract
Variability in memristive devices based on h-BN dielectrics is studied in depth. Different numerical techniques to extract the reset voltage are described and the corresponding cycle-to-cycle variability is characterized by means of the coefficient of variance. The charge-flux domain was employed to develop one of the extraction techniques, the calculation of the integrals of current and voltage to obtain the charge and flux allows to minimize the effects of electric noise and the inherent stochasticity of resistive switching on the measurement data. A model to reproduce charge versus flux curves has been successfully employed. The device variability is also described by means of the time series analysis to assess the memory effect along a resistive switching series. Finally, we analyzed I-V curves under ramped voltage stress utilizing a simulator based on circuit breakers, the formation and rupture of the percolation paths that constitute the conductive nanofilaments is studied to describe the set and reset processes behind the resistive switching operation.
Figures
Reference graph
Works this paper leans on
-
[1]
R., Shi, Y., Mahata, C., Yuan, B., Liang, X.,
Chen, S., Mahmoodi, M. R., Shi, Y., Mahata, C., Yuan, B., Liang, X., ... & Lanza, M. (2020). Wafer -scale integration of two -dimensional materials in high-density memristive crossbar arrays for artificial neural networks. Nature Electronics, 3(10), 638-645
work page 2020
-
[2]
The development of integrated circuits based on two -dimensional materials
K. Zhu, C. Wen, A. Aljarb, F. Xue, X. Xu, V. Tung, ... & M. Lanza, “The development of integrated circuits based on two -dimensional materials”, Nature Electronics, 4(11), 775- 785, 2021
work page 2021
-
[3]
Recommended methods to study resistive switching devices
M. Lanza, H. -S. P. Wong, E. Pop, D. Ielmini, D. Strukov, B.C. Regan, L. Larcher, M.A. Villena, J.J. Yang, L. Goux, A. Belmonte, Y. Yang, F. M. Puglisi, J. Kang, B. Magyari -Köpe, E. Yalon, A. Kenyon, M. Buckwell, A. Mehonic, A. Shluger, H. Li, T. -H. Hou, B. Hudec, D. Akinwande, R. Ge, S. Ambrogio, J.B. Roldan, E. Miranda, J. Suñe, K.L. Pey, X. Wu, N. Ra...
work page 2019
-
[4]
Progressive RESET induced by Joule heating in hBN RRAMs
P. Zhuang, P. Zhuang, W. Ma, J. Liu, W. Cai, W. Lin, “Progressive RESET induced by Joule heating in hBN RRAMs”, Appl. Phys. Lett. 118, 143101, 2021
work page 2021
-
[5]
Advanced data encryption using two-dimensional materials
M. Lanza, C. Wen, X. Li, T. Zanotti, F. M. Puglisi, Y. Shi, F. Saiz, A. Antidormi, S. Roche, W. Zheng, X. Liang, J. Hu, S. Duhm, K. Zhu, F. Hui, J. B. Roldan, B. Garrido, T. Wu, V. Chen, E. Pop, “Advanced data encryption using two-dimensional materials”, Advanced Materials, 2100185, 1-12, 2021
work page 2021
-
[6]
C. Liu, H. Chen, S. Wang et al. Two -dimensional materials for next - generation computing technologies. Nature Nanotechnology, 15, 545 –557, 2020
work page 2020
-
[7]
Electronic synapses made of layered two-dimensional materials
Y. Shi, X. Liang, B. Yuan, et al. “Electronic synapses made of layered two-dimensional materials”, Nature Electronics, 1, 458–465, 2018
work page 2018
-
[8]
Yao, J., Lin, J., Dai, Y. et al. Highly transparent nonvolatile resistive memory devices from silicon oxide and graphene. Nature Communications, 3, 1101, 2012
work page 2012
Show all 44 references
-
[9]
Graphene and Related Materials for Resistive Random Access Memories
Hui, F., Grustan-Gutierrez, E., Long, S., Liu, Q., Ott, A. K., Ferrari, A. C., Lanza, M., "Graphene and Related Materials for Resistive Random Access Memories", Advanced Electronic Materials 3, 1600195, 2017
2017
-
[10]
Coexistence of grain‐ boundaries‐assisted bipolar and threshold resistive switching in multilayer hexagonal boron nitride
C. Pan, Y. Ji, N. Xiao, F. Hui, K. Tang, Y. Guo, ... & M. Lanza, “Coexistence of grain‐ boundaries‐assisted bipolar and threshold resistive switching in multilayer hexagonal boron nitride”, Advanced functional materials, 27(10), 1604811, 2017
2017
-
[11]
H., McClellan, C., Shi, Y., Zheng, X., Chen, V., Lanza, M.,
Wang, C. H., McClellan, C., Shi, Y., Zheng, X., Chen, V., Lanza, M., ... & Wong, H. S. P. (2018, December). 3D monolithic stacked 1T1R cells using monolayer MoS 2 FET and hBN RRAM fabricated at low (150 C) temperature. In 2018 IEEE International Electron Devices Meeting (IEDM)...
2018
-
[12]
Yield, variability, reliability, and stability of two -dimensional materials based solid -state electronic devices
M. Lanza, Q. Smets, C. Huyghebaert, L. Lain -Jong, “Yield, variability, reliability, and stability of two -dimensional materials based solid -state electronic devices”, Nature Communications, 11, 5689, 2020
2020
-
[13]
Variability and Yield in h‐BN‐Based Memristive Circuits: The Role of Each Type of Defect
Shen, Y., Zheng, W., Zhu, K., Xiao, Y., Wen, C., Liu, Y., ... & Lanza, M. “Variability and Yield in h‐BN‐Based Memristive Circuits: The Role of Each Type of Defect”, Advanced Materials, 33(41), 2103656, 2021
2021
-
[14]
Standards for the Characterization of Endurance in Resistive Switching Devices
M. Lanza, R. Waser, D. Ielmini, J. J. Yang, L. Goux, J. Suñe, A.J. Kenyon, A. Mehonic, S. Spiga, V. Rana, S. Wiefels, S. Menzel, I. Valov, M. A. Villena, E. Miranda, X. Jing, F. Campabadal, M. Gonzalez, F. Aguirre, F. Palumbo, K. Zhu, J.B. Roldan, F.M. Puglisi, L. Larcher, T. ...
2021
-
[15]
Time series statistical analysis: a powerful tool to evaluate the variability of resistive switching memories
J.B. Roldán, F.J. Alonso, A.M. Aguilera, D. Maldonado, M. Lanza, “Time series statistical analysis: a powerful tool to evaluate the variability of resistive switching memories”, Journal of Applied Physics, 125, 174504, 2019
2019
-
[16]
A SPICE Compact Model of Metal Oxide Resistive Switching Memory With Variations,
X. Guan, S. Yu, and H. -S. Philip Wong, "A SPICE Compact Model of Metal Oxide Resistive Switching Memory With Variations," Electron Device Letters, IEEE, vol.33, no.10, pp.1405,1407, Oct. 2012
2012
-
[17]
Compact Modeling of RRAM Devices and Its Applications in 1T1R and 1S1R Array Design
P. Chen and S. Yu, "Compact Modeling of RRAM Devices and Its Applications in 1T1R and 1S1R Array Design" IEEE Transactions on Electron Devices, vol. 62, no. 12, pp. 4022-4028, Dec. 2015
2015
-
[18]
Robust compact model for bipolar oxide -based resistive switching memories
Bocquet M, Deleruyelle D, Aziza H, Muller C, Portal J -M, Cabout T and Jalaguier E, “Robust compact model for bipolar oxide -based resistive switching memories”, IEEE Trans. Electron Devices, 61, pp. 674–81, 2014. 7
2014
-
[19]
Resistive Switching: From Fundamentals of Nanoionic Redox Processes to Memristive Device Applications
D. Ielmini, R. Waser. “Resistive Switching: From Fundamentals of Nanoionic Redox Processes to Memristive Device Applications”, Wiley - VCH, 2015
2015
-
[20]
A Compact Model for Metal –Oxide Resistive Random Access Memory with Experiment Verification
Z. Jiang, Y. Wu, S. Yu, Member, L. Yang, K. Song, Z. Karim, H. -S. P. Wong, "A Compact Model for Metal –Oxide Resistive Random Access Memory with Experiment Verification", IEEE Transactions on Electron Devices, vol. 63, no. 5, pp. 1884-1892, May 2016
2016
-
[21]
Compact Model of HfOX -Based Electronic Synaptic Devices for Neuromorphic Computing
Huang, P., Zhu, D., Chen, S., Zhou, Z., Chen, Z., Gao, B., … Kang, J., “Compact Model of HfOX -Based Electronic Synaptic Devices for Neuromorphic Computing”, IEEE Transactions on Electron Devices, 64(2), 614–621, 2017
2017
-
[22]
On the Thermal Models for Resistive Random Access Memory Circuit Simulation
J. B. Roldán, G. González-Cordero, R. Picos, E. Miranda, F. Palumbo, F. Jiménez-Molinos, E. Moreno, D. Maldonado, S. B. Baldomá, M. Moner Al Chawa, C. de Benito, S. G. Stavrinides, J. Suñé, L. O. Chua, “On the Thermal Models for Resistive Random Access Memory Circuit Simulatio...
2021
-
[23]
Time series modeling of the cycle-to-cycle variability in h-BN based memristors,
J. B. Roldán. D. Maldonado, F.J. Alonso, A.M. Roldán, F. Hui, Y. Shi, F. Jiménez-Molinos, A.M. Aguilera, M. Lanza, "Time series modeling of the cycle-to-cycle variability in h-BN based memristors," 2021 IEEE International Reliability Physics Symposium (IRPS), 1-5, 2021
2021
-
[24]
Temperature of conductive nanofilaments in hexagonal boron nitride based memristors showing threshold resistive switching
M. Lanza, Y. Shi, F. Palumbo, F. Aguirre, S. Boyeras, B. Yuan, E. Yalon, E. Moreno, T. Wu, J. B. Roldan, “Temperature of conductive nanofilaments in hexagonal boron nitride based memristors showing threshold resistive switching”, Advanced Electronics Materials, 2100580, 2021
2021
-
[25]
Experimental study of the series resistance effect and its impact on the compact modeling of the conduction characteristics of HfO 2-based resistive switching memories
D. Maldonado, F. Aguirre, G. González -Cordero, A.M. Roldán, M.B. González, F. Jiménez -Molinos, F. Campabadal, E. Miranda, J.B. Roldán, "Experimental study of the series resistance effect and its impact on the compact modeling of the conduction characteristics of HfO 2-based ...
2021
-
[26]
Variability estimation in resistive switching devices, a numerical and kinetic Monte Carlo perspective
D. Maldonado, S. Aldana, M.B. González, F. Jiménez -Molinos, M.J. Ibáñez, D. Barrera, F. Campabadal, J.B. Roldán, "Variability estimation in resistive switching devices, a numerical and kinetic Monte Carlo perspective", Microelectronics Engineering, 257, 111736, 2022
2022
-
[27]
Memristor variability and stochastic physical properties modeling from a multivariate time series approach
F.J. Alonso, D. Maldonado, A.M. Aguilera, J. B. Roldan, "Memristor variability and stochastic physical properties modeling from a multivariate time series approach", Chaos, Solitons & Fractals, 143, 110461, 2021
2021
-
[28]
A Complex Model Via Phase -Type Distributions to Study Random Telegraph Noise in Resistive Memories
J. E. Ruiz -Castro, C. Acal, A.M. Aguilera, J. B. Roldan, "A Complex Model Via Phase -Type Distributions to Study Random Telegraph Noise in Resistive Memories", Mathematics, 9, 390, 2021
2021
-
[29]
Non - Uniform Spline Quasi -Interpolation to Extract the Series Resistance in Resistive Switching Memristors for Compact Modeling Purposes
M.J. Ibáñez, D. Barrera, D. Maldonado, R. Yáñez, J. B. Roldan, "Non - Uniform Spline Quasi -Interpolation to Extract the Series Resistance in Resistive Switching Memristors for Compact Modeling Purposes", Mathematics, 9, 2159, 2021
2021
-
[30]
Experimental Evaluation of the Dynamic Route Map in the Reset Transition of Memristive ReRAMs
D. Maldonado, M. B. González, F. Campabadal, F. Jiménez -Molinos, M. Moner Al Chawa, S. G. Stavrinides, J. B. Roldan, Rodrigo Picos, L. O. Chua, "Experimental Evaluation of the Dynamic Route Map in the Reset Transition of Memristive ReRAMs", Chaos, Solitons & Fractals, 139, 11...
2020
-
[31]
Comprehensive study on unipolar RRAM charge conduction and stochastic features, a simulation approach
D. Maldonado, F. M. Gomez -Campos, M.B. González, A.M. Roldán, F. Jiménez-Molinos, F. Campabadal, E. Miranda, J.B. Roldán, "Comprehensive study on unipolar RRAM charge conduction and stochastic features, a simulation approach", Journal of Physics D: Applied Physics, 55, 155104, 2022
2022
-
[32]
Defect‐Free Metal Deposition on 2D Materials via Inkjet Printing Technology
W. Zheng, F. Saiz, Y. Shen, K. Zhu, Y. Liu, C. McAleese, ... & M. Lanza, “Defect‐Free Metal Deposition on 2D Materials via Inkjet Printing Technology”, Advanced Materials, 2104138, 2021
2021
-
[33]
A 40nm 2Mb ReRAM macro with 85% reduction in forming time and 99% reduction in page-write time using auto -forming and auto -write schemes
Y.-C. Chiu, H.-W. Hu, L.-Y. Lai, T.-Y. Huang, H.-Y. Kao, K.-T. Chang, M.-S. Ho, C.-C. Chou, Y.-D. Chih, T.-Y. Chang, M.-F. Chang, “A 40nm 2Mb ReRAM macro with 85% reduction in forming time and 99% reduction in page-write time using auto -forming and auto -write schemes”, 2019 ...
2019
-
[34]
Memory devices and applications for in-memory computing
A. Sebastian, M. Le Gallo, R Khaddam -Aljameh et al., “Memory devices and applications for in-memory computing”, Nature nanotechnology 15, 529 – 544, 2020
2020
-
[35]
M. Kim, E. Pallecchi, R. Ge, X. Wu, G. Ducournau, J. C. Lee, H. Happy, D. Akinwande, Analogue switches made from boron nitride monolayers for application in 5G and terahertz communication systems. Nat. Electron. 3, 479- 485 (2020)
2020
-
[36]
Hardware -intrinsic security primitives enabled by analogue state and nonlinear conductance variations in integrated memristors
H. Nili, G.C. Adam, B. Hoskins, M. Prezioso, J. Kim, M. Reza Mahmoodi, F. M. Bayat, O. Kavehei & D. B. Strukov, “Hardware -intrinsic security primitives enabled by analogue state and nonlinear conductance variations in integrated memristors”, Nat Electron 1, 197–202, 2018
2018
-
[37]
Memristors with initial low resistive state for efficient neuromorphic systems
K. Zhu, M.R. Mahmoodi, Z. Fahimi, Y. Xiao, T. Wang, K. Bukvišová, M. Kolíbal, J.B. Roldan, D. Perez, M. Lanza, “Memristors with initial low resistive state for efficient neuromorphic systems”, Advanced Intelligent Systems, 2200001, 2022
2022
-
[38]
Analysis and modeling of resistive switching statistics
S. Long, C. Cagli, D. Ielmini, M. Liu, J. Suñe, “Analysis and modeling of resistive switching statistics”, Journal of Applied Physics, 111, 074508, 2012
2012
-
[39]
Resistive Switching in HfO 2 based valence change memories, a comprehensive 3D kinetic Monte Carlo approach
S. Aldana, P. García -Fernández, R. Romero -Zaliz, M.B. González, F. Jiménez-Molinos, F. Gómez-Campos, F. Campabadal, J.B. Roldán, "Resistive Switching in HfO 2 based valence change memories, a comprehensive 3D kinetic Monte Carlo approach", Journal of Physics D: Applied Physi...
2020
-
[40]
Exploring Resistive Switching based Memristors in the Charge -Flux Domain, a modeling Approach
M.M. Al Chawa, R. Picos, J.B. Roldán, F. Jiménez -Molinos, M.A. Villena, and C. de Benito, “Exploring Resistive Switching based Memristors in the Charge -Flux Domain, a modeling Approach”, International Journal of Circuit Theory & Applications, 46, pp. 29-38, 2018
2018
-
[41]
Introduction to Time Series and Forecasting
P. J. Brockwell, R. A. Davis, “Introduction to Time Series and Forecasting”, Second Edition, Springer, 2002
2002
-
[42]
Time series analysis and forecasting by example
S.Bisgaard, M.Kulahci, “Time series analysis and forecasting by example”, Wiley 2011
2011
-
[43]
Resistive switching devices producing giant random telegraph noise
T. Becker, X. Li, E. Moser, P. Alves, G. Wirth, M. Lanza, “Resistive switching devices producing giant random telegraph noise”, IEEE Electron device letters 43, 146, 2022
2022
-
[44]
Excess entropy and thermal behavior of Cu- and Ti-doped bioactive glasses
E. Wers, H. Oudadesse, B. Lefeuvre, J. Rocherullé, R. Lebullenger, “Excess entropy and thermal behavior of Cu- and Ti-doped bioactive glasses”, Journal of Thermal Analysis and Calorimetry, 117, 579–588, 2014
2014
Reviewed August 12, 2026 · model on record in the stance chip above.
Discussion (0). Continue with ORCID to comment.