Typed states for the displayed outbound observations.
Source: paper_references, paper_reference_links, observed 2026-08-08T12:14:11.936367Z
Paper Citation Record · LEDGER
Inverse mask design for interference lithography using automatic differentiable wave propagation
As of 20 August 2026, this Paper Citation Record lists 12 of 12 outbound references and 0 inbound Pith citation observations for arXiv:2608.05488.
A citation records a reference. It does not transfer a finding from one paper to another.
Coverage vector
One-hop event checks from named stored sources.
Source: scholarly_work_events, retraction_status_cache, observed 2026-08-20T06:33:59.587034+00:00
Pith citing papers itemized under the disclosed page cap.
Source: paper_references, paper_reference_links
A source-named dated measurement, never combined with another source.
Source: cited_works
Reference resolution
12 of 12 outbound references displayed
- verified exact1
- verified fuzzy11
- unresolved0
- parse uncertain0
- malformed identifier0
- metadata mismatch0
External citation measurements
No source-named external measurement is stored.
Outbound references
Observation d9dbe50c-b945-4964-8d1f-5158b53329de · outbound
This paper cites Interference lithography at euv and soft x-ray wavelengths: Principles, methods, and applications,.
Inverse mask design for interference lithography using automatic differentiable wave propagation Interference lithography at euv and soft x-ray wavelengths: Principles, methods, and applications,
Reference 1
- Resolution
- verified fuzzy
- raw_fallback, observed 2026-08-08T12:14:12.149855Z
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.
Observation 37e7ab2d-3b7d-4d9e-874f-2e20019003b3 · outbound
This paper cites Extreme ultraviolet lithography reaches 5 nm resolution,.
Inverse mask design for interference lithography using automatic differentiable wave propagation Extreme ultraviolet lithography reaches 5 nm resolution,
Reference 2
- Resolution
- verified fuzzy
- raw_fallback, observed 2026-08-08T12:14:12.134383Z
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.
Observation 49d55e06-8990-4af5-9c95-d9b5d5edace2 · outbound
This paper cites Holographic EUV Lithography at 40 nm Resolution.
Inverse mask design for interference lithography using automatic differentiable wave propagation Holographic EUV Lithography at 40 nm Resolution
Reference 3
- Resolution
- verified exact
- local_arxiv, observed 2026-08-08T12:14:11.978138Z
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.
Observation 54c24ab9-d530-498e-9fa6-0702b625dbf0 · outbound
This paper cites S., Nam, C.-Y., and Yoo, S., [Physics-Informed Machine Learning for Mask Design in Interference Lithography], 1–4, Society for Industrial and Applied Mathematics (2025).
Inverse mask design for interference lithography using automatic differentiable wave propagation S., Nam, C.-Y., and Yoo, S., [Physics-Informed Machine Learning for Mask Design in Interference Lithography], 1–4, Society for Industrial and Applied Mathematics (2025)
Reference 4
- Resolution
- verified fuzzy
- raw_fallback, observed 2026-08-08T12:14:12.119491Z
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.
Observation 27e4b021-cf32-47b0-bf70-8f6462b20c3b · outbound
This paper cites Band-limited angular spectrum method for numerical simulation of free-space propagation in far and near fields,.
Inverse mask design for interference lithography using automatic differentiable wave propagation Band-limited angular spectrum method for numerical simulation of free-space propagation in far and near fields,
Reference 5
- Resolution
- verified fuzzy
- raw_fallback, observed 2026-08-08T12:14:12.104319Z
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.
Observation 8d11bef7-8584-4f9b-b449-7506cc365e00 · outbound
This paper cites Shifted angular spectrum method for off-axis numerical propagation,.
Inverse mask design for interference lithography using automatic differentiable wave propagation Shifted angular spectrum method for off-axis numerical propagation,
Reference 6
- Resolution
- verified fuzzy
- raw_fallback, observed 2026-08-08T12:14:12.089140Z
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.
Observation c2426c4c-ee77-47a6-8ffb-701c33b5703f · outbound
This paper cites Dose-efficient automatic differentiation for ptychographic reconstruction,.
Inverse mask design for interference lithography using automatic differentiable wave propagation Dose-efficient automatic differentiation for ptychographic reconstruction,
Reference 7
- Resolution
- verified fuzzy
- raw_fallback, observed 2026-08-08T12:14:12.073357Z
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.
Observation 6ffc03dc-88d9-488b-b798-c1a584f1bb6b · outbound
This paper cites Au- tophasenn: unsupervised physics-aware deep learning of 3d nanoscale bragg coherent diffraction imaging,.
Inverse mask design for interference lithography using automatic differentiable wave propagation Au- tophasenn: unsupervised physics-aware deep learning of 3d nanoscale bragg coherent diffraction imaging,
Reference 8
- Resolution
- verified fuzzy
- raw_fallback, observed 2026-08-08T12:14:12.056823Z
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.
Observation 9df76d40-d81e-4901-a9b0-dbd4d0910ee8 · outbound
This paper cites Enhanced EUV mask imaging using Fourier ptychographic microscopy,.
Inverse mask design for interference lithography using automatic differentiable wave propagation Enhanced EUV mask imaging using Fourier ptychographic microscopy,
Reference 9
- Resolution
- verified fuzzy
- raw_fallback, observed 2026-08-08T12:14:12.041091Z
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.
Observation d26bb72f-bfe0-42c5-a98c-ddc1b6f9b561 · outbound
This paper cites Open-source differentiable lithography imaging framework,.
Inverse mask design for interference lithography using automatic differentiable wave propagation Open-source differentiable lithography imaging framework,
Reference 10
- Resolution
- verified fuzzy
- raw_fallback, observed 2026-08-08T12:14:12.025761Z
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.
Observation dd79ac73-68d9-4886-9777-bd48102cbfb8 · outbound
This paper cites Shifted fresnel diffraction for computational holography,.
Inverse mask design for interference lithography using automatic differentiable wave propagation Shifted fresnel diffraction for computational holography,
Reference 11
- Resolution
- verified fuzzy
- raw_fallback, observed 2026-08-08T12:14:12.010354Z
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.
Observation bdd24b69-9a00-4b2b-9bcd-d13b0f4d0636 · outbound
This paper cites Adam: A method for stochastic optimization,.
Inverse mask design for interference lithography using automatic differentiable wave propagation Adam: A method for stochastic optimization,
Reference 12
- Resolution
- verified fuzzy
- raw_fallback, observed 2026-08-08T12:14:11.995395Z
Source-reported events for the cited work
No event found in the named queried sources as of 2026-08-20T06:33:59.587034+00:00.
Pith citing papers
No inbound Pith citation observations are available.