Pith. sign in

REVIEW

Application-driven Design Exploration for Dense Ferroelectric Embedded Non-volatile Memories

Not yet reviewed by Pith; the record is open.

This paper has not been read by Pith yet. Machine review is queued; the pith claim, tier, and objections will appear here once it completes.

SPECIMEN: schema-true, not a live event

T0 review · schema-true

One-sentence machine reading of the paper's core claim.

pith:XXXXXXXX · record.json · timestamp

arxiv 2106.11757 v1 pith:HZPB4OEN submitted 2021-06-18 cs.DC

Application-driven Design Exploration for Dense Ferroelectric Embedded Non-volatile Memories

classification cs.DC
keywords designmemoryaccuracydata-intensiveembeddedexplorationmemoriesmulti-level
verification ladder T0 review T1 audit T2 compute T3 formal T4 reserved
0 comments
read the original abstract

The memory wall bottleneck is a key challenge across many data-intensive applications. Multi-level FeFET-based embedded non-volatile memories are a promising solution for denser and more energy-efficient on-chip memory. However, reliable multi-level cell storage requires careful optimizations to minimize the design overhead costs. In this work, we investigate the interplay between FeFET device characteristics, programming schemes, and memory array architecture, and explore different design choices to optimize performance, energy, area, and accuracy metrics for critical data-intensive workloads. From our cross-stack design exploration, we find that we can store DNN weights and social network graphs at a density of over 8MB/mm^2 and sub-2ns read access latency without loss in application accuracy.

discussion (0)

Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.