Pith. sign in

REVIEW 5 major objections 6 minor 37 references

Polarization engineered all 2D Graphene/Ferroelectric hybrid for persistence-free photoresponse

T0 review · 5 major / 6 minor · reviewed 2026-08-11 · deepseek-v4-flash

Pith's one-line read This paper claims that in a bilayer graphene/bilayer 3R-MoS2 hybrid, illumination reduces the ferroelectric polarization of 3R-MoS2, creating an optically controlled gate that makes the photoresponse persistence-free and millisecond-fast.

desk verdict A genuinely new application of sliding ferroelectricity to photodetection, with a plausible but not fully proven mechanism; deserves serious refereeing. read the letter →

arxiv 2608.09300 v1 pith:OZXVAA44 submitted 2026-08-10 cond-mat.mes-hall

classification cond-mat.mes-hall
keywords emergentferroelectricityrhombohedralstackingslidingbilayergraphene3R-MoS2persistence-freephotoresponsephotogatingvanderWaalsphotodetector
verification ladder T0 review T1 audit T2 compute T3 formal

The pith

A machine-rendered reading of the paper's core claim, the machinery that carries it, and where it could break.

The reading

This paper argues that the usual speed-versus-sensitivity trade-off in graphene/transition-metal-dichalcogenide photodetectors can be broken by using a ferroelectric form of molybdenum disulfide, 3R-MoS2. In a hybrid of bilayer graphene and bilayer 3R-MoS2, light lowers the spontaneous out-of-plane polarization of the ferroelectric, which acts as an optically controlled gate that changes the electrostatic environment of the graphene channel. The result is a persistence-free photoresponse in the hole-doped regime: the signal returns to baseline in roughly 20 ms rather than persisting for minutes, and the response time does not depend on temperature between 100 K and 165 K. If the mechanism is right, it converts a slow, trap-dominated detector into one that resolves repeated low-intensity pulses, with measured detection down to about 31 photons per pulse and a gain-bandwidth product near $10^{8}$ Hz.

What carries the argument

The central object is sliding ferroelectricity in rhombohedrally stacked bilayer 3R-MoS2, where non-centrosymmetric AB/BA stacking creates a spontaneous out-of-plane polarization that persists at room temperature. The load-bearing identity is the polarization-modulation cycle: illumination dopes the MoS2, lowers that polarization, reduces the interfacial field $E_{i,P}$ at the BLG/MoS2 junction, and thereby boosts the effective displacement field $D$ seen by the bilayer graphene. Layer polarization under $D$ then routes the photoresponse: holes concentrate in the top graphene layer, away from the interface, giving a persistence-free response, while electrons flow in the bottom layer, closer to the interface, giving partial persistence.

What would settle it

Measure the out-of-plane polarization of the 3R-MoS2 bilayer in the operating device, for example with Kelvin probe force microscopy or optical second-harmonic generation, before, during, and after a 532 nm pulse at 100 K with the same gate voltages. If the polarization does not change while the fast, temperature-independent millisecond photoresponse remains, the proposed polarization-modulation mechanism is ruled out.

Watch

Extended reading notes

Core claim

The central claim is that photoinduced doping lowers the polarization in 3R-MoS2, reducing the interfacial field at the bilayer graphene/MoS2 junction, so that the effective displacement field on the graphene increases and shifts its Fermi level; this optically controlled gating produces a temperature-independent photoresponse with response times on the order of tens of milliseconds, limited by the measurement instrument. In the hole-doped regime the response is persistence-free, with a rise time of 9.5±2 ms and fall components of 23±5.8 ms and 600±37.8 ms, whereas the electron-doped regime shows partial persistence because electrons transported in the bottom graphene layer sit closer to the interface and can be trapped. The paper reports a photogain of $3.1\times10^{7}$, a gain-bandwidth product of about $5\times10^{8}$ Hz, an internal quantum efficiency of about 10%, and a minimum detectable photon number of 31 in single-shot measurements, with the same device switchable to a non-volatile optical memory mode by tuning the Fermi level.

Load-bearing premise

That light actually changes the built-in electric polarization of the 3R-stacked MoS2 layer, and that this polarization change is what makes the photoresponse fast and persistence-free; the paper infers this from transport data and earlier literature rather than from a direct measurement of polarization in the device.

Editorial extensions

If this is right

  • Persistence-free, temperature-independent photoresponse should be reproducible in repeated low-intensity optical pulses in the hole-doped regime, operating as a linear detector.
  • Displacement field $D$ becomes a tunable knob: increasing $D$ amplifies responsivity, allowing detector performance to be optimized independently of material choice.
  • Because the fall time is instrument-limited rather than thermally activated, the measured bandwidth is a lower bound; faster electronics should reveal the intrinsic limit.
  • Tuning the Fermi level between hole- and electron-doped regimes switches the same device between repeatable detection and non-volatile optical memory.
  • A gain-bandwidth product near $10^{8}$ Hz together with 31-photon detection establishes a benchmark for low-light all-2D photodetectors.

Reading between the lines

Editorial extensions of the paper, not claims the author makes directly.

  • If the polarization-modulation mechanism is generic, the same persistence-free behavior should appear in graphene paired with other sliding ferroelectrics, such as 3R-WS2, 3R-WSe2, or twisted TMD bilayers, turning this from a single-device result into a family of detectors.
  • A direct in-operando measurement of the 3R-MoS2 polarization under illumination would close the inference gap the authors leave open, since their evidence for the mechanism is transport-based.
  • The electron-doped persistent mode, treated here as a side effect, could be developed into a single-pulse-write optical memory with the same device.
  • Engineering the ferroelectric's polarization magnitude, rather than passivating traps, is the implied lever for pushing response times below the current instrument limit.
Share X Bluesky LinkedIn Reddit HN

Editorial analysis

A structured set of objections, weighed in public.

Desk editor's note, referee report, and a circularity audit.

Referee Report

5 major / 6 minor

Summary. The paper reports a dual-gated bilayer graphene (BLG) / bilayer 3R-MoS2 van der Waals heterostructure photodetector and claims that photoinduced modulation of the spontaneous out-of-plane polarization in 3R-MoS2 produces an optically controlled gating effect on the BLG channel. The authors report a persistence-free photoresponse in the hole-doped regime, response times of tens of milliseconds, a gain-bandwidth product near 10^8 Hz, and a minimum detectable photon number of about 31 per pulse. The central mechanism is proposed in Section IV: illumination lowers the polarization of 3R-MoS2, reduces the interfacial field, changes the effective displacement field, and thereby shifts the Fermi level in BLG. The paper is primarily an experimental study with transport and optoelectronic characterization, supported by KPFM, PL, and Raman identification of the 3R phase.

Significance. If the proposed mechanism is correct, the work would be significant because it offers a route to decouple sensitivity from persistence in graphene/TMD photodetectors, a long-standing trade-off in trap-mediated photogating devices. The experimental dataset is rich: the authors show doping-dependent photoresponse asymmetry, power- and temperature-dependent timescales, and a systematic displacement-field tuning of the response. The device performance metrics, particularly the persistence-free operation at low temperature and the reported photon-counting capability, are noteworthy. However, the central mechanistic claim is not directly evidenced in the manuscript: no measurement under illumination directly probes the polarization state of 3R-MoS2, and the supporting quantitative comparison (Section IV) relies on quantities derived from the photoresponse itself. The paper would be substantially strengthened by a direct polarization probe or a control device without the ferroelectric layer.

major comments (5)
  1. [Section IV] The quantitative support for the polarization-modulation mechanism is not independent. The quantity ΔV_bg-A is obtained by dividing the measured resistance change R_A by dR/dVbg, so it is a rescaling of the photoresponse; the comparison with ΔV_op-m, which depends on the absorption coefficient and top-gate transmission (uncertainties acknowledged in the same section), therefore tests only internal consistency of the model. An order-of-magnitude match between two quantities that both derive from the same photoresponse does not uniquely establish a photoinduced change in polarization. A direct probe (e.g., KPFM under illumination, or polarization-sensitive optical measurement) or a control experiment with a 2H-MoS2 device of comparable interface quality is needed.
  2. [Sections III and IV] Alternative non-ferroelectric explanations are not excluded. In Section IV the authors themselves state that there is "a lower density of localized trap states at the Gr/TMD interface in bilayer configuration" for 3R stacking, which could explain the persistence-free response through reduced trapping without invoking polarization modulation. Moreover, the bi-exponential decay in the hole-doped regime (Section III, Eq. 1) includes a 600 ms component attributed to deep traps, showing that trap processes are still active. The claim that the persistence-free response is governed by polarization modulation therefore needs a control measurement that separates the trap-density effect from the polarization effect, for example a 2H-MoS2 device fabricated and measured under identical conditions.
  3. [Section III, Eq. (1) and GBW discussion] Eq. (1) is written as a rising exponential, ∆R = R_A(1−e^{(t−t0)/τ_A}) + R_B(1−e^{(t−t0)/τ_B}), but the text uses it to describe the decay after the pulse; this appears to be a sign error that prevents the reader from checking the fit. In addition, the statement that the rise time of 9.5±2 ms is "instrument-limited" is unsupported because no instrument response function or bandwidth characterization is provided. If the timescale is indeed instrument-limited, the observed flat power and temperature dependence of τ_A (Fig. 3c–e) cannot be used to argue for a thermally independent mechanism.
  4. [Section III, Eqs. (2)-(3)] The photon-number calibration uses ΔR_1e = dR/dVbg × e/Cbg, which assumes that the measured resistance change is equivalent to a change in gate voltage produced by a single electron. This equivalence is exactly the hypothesis under investigation, so the extracted values of 31 photons and IQE = 10% inherit model dependence. The reported uncertainty of ±10 photons from the Poisson fit does not include systematic errors from the absorption coefficient and top-gate transmission, which are acknowledged to be uncertain in Section IV. The photon-counting claim should be backed by an independent calibration or a stated error budget.
  5. [Sections III and IV] The sign interpretation is internally inconsistent. In Section III, the sign of R_PH is said to suggest "net transfer of electrons from BLG to the TMD layer," which is a charge-transfer picture. In Section IV, the same sign is attributed to a photoinduced reduction in polarization that changes the effective displacement field. Both mechanisms can produce the same resistance sign in this device geometry, so the sign alone does not discriminate between them. The paper should either provide a measurement that separates charge transfer from field gating (for example, a Hall measurement) or explicitly state that the sign is not a fingerprint of the polarization mechanism.
minor comments (6)
  1. [Section II] The KPFM description says "amplitude of 11 nm" and "AC bias of 2 V"; the amplitude unit should be checked because KPFM amplitude is usually reported in volts or nanometers depending on the mode, and the current phrasing is ambiguous.
  2. [Section III] In the PL spectra description, "neural" should be "neutral" (A exciton).
  3. [Section III, Fig. 1c] The KPFM text reports an interlayer potential difference ∆V_KPFM of approximately 70 mV, while the transport section states the minimum resistance at CNP occurs at D = -0.058 V/nm and "closely matches the interlayer potential of ≈55 meV." The relation between these two numbers (mV vs meV) should be clarified.
  4. [Section III, Fig. 3 caption] The caption lists two panels labeled (c) and uses (d) twice; this makes it difficult to follow which panel shows inverse rise time, fall time, and the extracted τ_A and τ_B. Please relabel the panels.
  5. [Abstract and Section III] The gain-bandwidth product is stated as approximately 10^8 Hz in the abstract but as approximately 5 × 10^8 Hz in Section III; please make the numbers consistent or explain the difference.
  6. [Section III] The sentence "We ensure device operation in a regime where Vtg > 0 and Vbg is < 0, such that D is consistently directed downward" is in Section IV, not Section III, so the cross-reference in the text should be corrected.

Circularity Check

0 steps flagged · score 0.0 of 10

No significant circularity: the central mechanism rests on independent prior work and direct device measurements.

full rationale

The paper's central claim—that photoinduced polarization modulation in 3R-MoS2 gates the bilayer graphene channel—is supported by independent characterization of ferroelectric 3R stacking via KPFM, PL, and low-frequency Raman; by direct transport and time-resolved photoresponse measurements; and by citation of external prior work (Refs. 24, 35) establishing photoinduced polarization tuning in sliding ferroelectrics. The consistency check in Section IV compares ΔV_op−m, computed from optical power, absorption coefficient, and transmission, with ΔV_bg−A = R_A/(dR/dV_BG), extracted from the electrical photoresponse; these are independent inputs, not the same fitted quantity. The photon-counting calibration uses dR/dV_BG and e/C_BG to convert resistance change to charge, a standard electrostatic conversion rather than a circular prediction. Self-citations (Refs. 2, 5, 6) are used only as experimental benchmarks for comparison of rise/fall times and are not load-bearing for the central mechanism. No equation in the derivation is defined in terms of its target result, and no fitted parameter is renamed as a prediction. The inference that polarization modulation causes the persistence-free response is a plausible model interpretation rather than a definitional tautology; the absence of a direct polarization measurement under illumination is an evidence limitation, not circularity.

Assumptions & free parameters 4 free parameters · 4 assumptions · 0 invented entities

The central interpretation relies on the ferroelectric polarization of 3R-MoS2 and its response to light, both taken from prior literature or inferred from transport. The free parameters are mainly nuisance parameters in converting resistance changes to photon numbers and gate voltages; the bi-exponential timescales are descriptive fits. No new physical entities are introduced.

free parameters (4)
  • Absorption coefficient of 3R-MoS2 at 532 nm = not stated in main text
    Used to convert incident power to absorbed photon number for IQE and photon count. Uncertain; no error quoted.
  • Optical transmission through top gate electrode = not stated
    Corrects incident power; mentioned as an uncertainty in Section IV.
  • Back-gate capacitance Cbg = geometric, from hBN thickness about 30 nm
    Used in ΔV1e_bg = e/Cbg to convert resistance change to photon number; standard but contributes to systematic uncertainty.
  • Bi-exponential fit parameters τA, τB, RA, RB = τA about 23±5.8 ms, τB about 600±37.8 ms
    Fitted to temporal photoresponse traces to extract rise and fall timescales; descriptive of data, not a physical constant.
assumptions (4)
  • domain assumption 3R-MoS2 bilayer has spontaneous out-of-plane ferroelectric polarization that persists at 100 K.
    Established by KPFM and prior literature (refs 10, 11); the device electrostatics depends on this.
  • domain assumption Photoinduced doping reduces the polarization of sliding ferroelectrics.
    Invoked in Section IV with refs 24 and 35; central to the proposed mechanism but not directly measured in this device.
  • standard math BLG under displacement field develops layer-polarized bands with holes localized in the top layer for downward D.
    Standard BLG band theory; used to explain doping-asymmetric persistence.
  • domain assumption The photoresistance can be converted to an equivalent gate-voltage shift via dR/dVbg measured in the dark.
    Used in Eqs. (2)-(3) and in comparing ΔV_op-m with ΔV_bg-A; assumes the response is purely electrostatic gating.

how reviews work

0 comments
Cite this review

Pith. "Pith review of Polarization engineered all 2D Graphene/Ferroelectric hybrid for persistence-free photoresponse." pith.science (2026). https://pith.science/paper/OZXVAA44

@misc{pith2026260809300,
  author       = {Pith},
  title        = {Pith review of: Polarization engineered all 2D Graphene/Ferroelectric hybrid for persistence-free photoresponse},
  year         = {2026},
  howpublished = {\url{https://pith.science/paper/OZXVAA44}},
  note         = {Machine review of arXiv:2608.09300}
}
read the original abstract

Graphene-based van der Waals hybrid photodetectors typically work on trap-mediated photogating mechanism, exhibiting high sensitivity, but under-perform in the fast detection of repetitive optical signals. Designing photodetectors that are simultaneously fast and highly sensitive has therefore remained difficult. In this work, we realize both attributes by integrating atomically thin sliding ferroelectrics in the design architecture, thereby uniting semiconducting properties with intrinsic polarization fields capable of efficiently governing interfacial photocarrier dynamics. We report a bilayer graphene-bilayer MoS2 (with MoS2 in a rhombohedrally stacked (3R) configuration) van der Waals photodetector with edge-contacted dual-gated field-effect transistor architecture. The photo-induced modulation in spontaneous out-of-plane polarization of 3R-MoS2 and selective confinement of charge carriers in bilayer graphene under an out-of-plane displacement field results in a tunable persistence-free photoresponse. Here, the photoinduced polarization change in 3R-MoS2 produces an optically controlled gating effect that alters the electrostatic environment of bilayer graphene, resulting in a temperature-independent photoresponse with rapid response times of the order of 10's of milliseconds (limited by the measurement instrument). We demonstrate reproducible detection of optical signals and examine the photon-counting resolution of this structure in high-sensitivity regimes, where we determine its internal quantum efficiency to be 10 percent with minimum detectable photon number of 31 in single shot measurements. This work highlights the functionality of 3R-MoS2 in manipulating the interfacial charge dynamics and establishes the hybrid of graphene and ferroelectric 3R-MoS2 as a promising platform for ultra-sensitive optoelectronic devices.

Figures

Figures reproduced from arXiv: 2608.09300 by the authors.

Figure 1
Figure 1. FIG. 1. Characterization of BLG/3R-MoS [PITH_FULL_IMAGE:figures/full_fig_p003_1.png] view at source ↗
Figure 2
Figure 2. FIG. 2. Photoresponse in BLG/3R-MoS [PITH_FULL_IMAGE:figures/full_fig_p005_2.png] view at source ↗
Figure 3
Figure 3. FIG. 3. Persistence-free photoresponse in hole-doped regime. (a) ∆R as a function of time at [PITH_FULL_IMAGE:figures/full_fig_p006_3.png] view at source ↗
Figures from the paper (1 more)
Figure 4
Figure 4. Figure 4: FIG. 4. Ultra-low light detection with BLG/3R-MoS [PITH_FULL_IMAGE:figures/full_fig_p006_4.png]

Discussion (0). Continue with ORCID to comment.

Reference graph

Works this paper leans on

37 extracted references · 32 canonical work pages

  1. [1]

    Bernardi, M

    M. Bernardi, M. Palummo, and J. C. Grossman, Ex- traordinary sunlight absorption and one nanometer thick photovoltaics using two-dimensional monolayer materi- als, Nano letters13, 3664 (2013)

  2. [2]

    K. Roy, M. Padmanabhan, S. Goswami, T. P. Sai, G. Ra- malingam, S. Raghavan, and A. Ghosh, Graphene–mos2 9 hybrid structures for multifunctional photoresponsive memory devices, Nature nanotechnology8, 826 (2013)

  3. [3]

    Ahmed, K

    T. Ahmed, K. Roy, S. Kakkar, A. Pradhan, and A. Ghosh, Interplay of charge transfer and disorder in optoelectronic response in graphene/hbn/mos2 van der waals heterostructures, 2D Materials7, 025043 (2020)

  4. [4]

    N. K. Gill, S. Sett, R. Debnath, A. Singha, K. Watan- abe, T. Taniguchi, and A. Ghosh, Moir´ e ferroelectricity- enhanced optoelectronic response in an all-2d van der waals hybrid, Small21, e05797 (2025)

  5. [5]

    Parappurath, S

    A. Parappurath, S. Mitra, G. Singh, N. K. Gill, T. Ahmed, T. P. Sai, K. Watanabe, T. Taniguchi, and A. Ghosh, Interlayer charge transfer and photodetection efficiency of graphene–transition-metal-dichalcogenide heterostructures, Physical Review Applied17, 064062 (2022)

  6. [6]

    Kashid, J

    R. Kashid, J. K. Mishra, A. Pradhan, T. Ahmed, S. Kakkar, P. Mundada, P. Deshpande, K. Roy, A. Ghosh, and A. Ghosh, Observation of inter-layer charge transmission resonance at optically excited graphene–tmdc interfaces, APL Materials8(2020)

  7. [7]

    Mitra, S

    S. Mitra, S. Kakkar, T. Ahmed, and A. Ghosh, Graphene- ws 2 van der waals hybrid heterostructure for photode- tector and memory device applications, Physical Review Applied14, 064029 (2020)

  8. [8]

    Li and M

    L. Li and M. Wu, Binary compound bilayer and mul- tilayer with vertical polarizations: two-dimensional fer- roelectrics, multiferroics, and nanogenerators, ACS nano 11, 6382 (2017)

Show all 37 references
  1. [9]

    S. Sett, T. Paul, and A. Ghosh, van der waals hybrids for ferroelectric device application, Annual Review of Mate- rials Research55(2025)

  2. [10]

    X. Wang, K. Yasuda, Y. Zhang, S. Liu, K. Watanabe, T. Taniguchi, J. Hone, L. Fu, and P. Jarillo-Herrero, In- terfacial ferroelectricity in rhombohedral-stacked bilayer transition metal dichalcogenides, Nature nanotechnology 17, 367 (2022)

  3. [11]

    Weston, E

    A. Weston, E. G. Castanon, V. Enaldiev, F. Ferreira, S. Bhattacharjee, S. Xu, H. Corte-Le´ on, Z. Wu, N. Clark, A. Summerfield, et al., Interfacial ferroelectricity in marginally twisted 2d semiconductors, Nature nanotech- nology17, 390 (2022)

  4. [12]

    S. Sett, R. Debnath, A. Singha, S. Mandal, K. Jyoth- sna, M. Bhakar, K. Watanabe, T. Taniguchi, V. Raghu- nathan, G. Sheet, et al., Emergent inhomogeneity and nonlocality in a graphene field-effect transistor on a near- parallel moir´ e superlattice of transition metal dichalc...

  5. [13]

    K. Ko, A. Yuk, R. Engelke, S. Carr, J. Kim, D. Park, H. Heo, H.-M. Kim, S.-G. Kim, H. Kim, et al., Operando electron microscopy investigation of polar domain dy- namics in twisted van der waals homobilayers, Nature Materials22, 992 (2023)

  6. [14]

    Y. Wang, Z. Wang, W. Yao, G.-B. Liu, and H. Yu, In- terlayer coupling in commensurate and incommensurate bilayer structures of transition-metal dichalcogenides, Physical Review B95, 115429 (2017)

  7. [15]

    D. Yang, J. Wu, B. T. Zhou, J. Liang, T. Ideue, T. Siu, K. M. Awan, K. Watanabe, T. Taniguchi, Y. Iwasa,et al., Spontaneous-polarization-induced photovoltaic effect in rhombohedrally stacked mos2, Nature Photonics16, 469 (2022)

  8. [16]

    Liang, D

    J. Liang, D. Yang, J. Wu, J. I. Dadap, K. Watanabe, T. Taniguchi, and Z. Ye, Optically probing the asym- metric interlayer coupling in rhombohedral-stacked mos 2 bilayer, Physical Review X12, 041005 (2022)

  9. [17]

    Scuri, T

    G. Scuri, T. I. Andersen, Y. Zhou, D. S. Wild, J. Sung, R. J. Gelly, D. B´ erub´ e, H. Heo, L. Shao, A. Y. Joe,et al., Electrically tunable valley dynamics in twisted wse 2/wse 2 bilayers, Physical review letters124, 217403 (2020)

  10. [18]

    J. Choi, M. Florian, A. Steinhoff, D. Erben, K. Tran, D. S. Kim, L. Sun, J. Quan, R. Claassen, S. Majumder, et al., Twist angle-dependent interlayer exciton lifetimes in van der waals heterostructures, Physical Review Let- ters126, 047401 (2021)

  11. [19]

    H. Wan, J. Yu, K. Yang, Y. Zhu, J.-W. Li, H. Fu, X. Shi, and J. Zhang, Defect-mediated carrier trapping and non- radiative recombination in two-dimensional sliding ferro- electrics, The Journal of Chemical Physics164(2026)

  12. [20]

    J. Wu, D. Yang, J. Liang, M. Werner, E. Ostroumov, Y. Xiao, K. Watanabe, T. Taniguchi, J. I. Dadap, D. Jones, et al., Ultrafast response of spontaneous photo- voltaic effect in 3r-mos2–based heterostructures, Science Advances8, eade3759 (2022)

  13. [21]

    K. S. Novoselov, A. K. Geim, S. V. Morozov, D.-e. Jiang, Y. Zhang, S. V. Dubonos, I. V. Grigorieva, and A. A. Firsov, Electric field effect in atomically thin carbon films, science306, 666 (2004)

  14. [22]

    L. Wang, I. Meric, P. Huang, Q. Gao, Y. Gao, H. Tran, T. Taniguchi, K. Watanabe, L. Campos, D. Muller,et al., One-dimensional electrical contact to a two-dimensional material, Science342, 614 (2013)

  15. [23]

    C. R. Dean, A. F. Young, I. Meric, C. Lee, L. Wang, S. Sorgenfrei, K. Watanabe, T. Taniguchi, P. Kim, K. L. Shepard, et al., Boron nitride substrates for high- quality graphene electronics, Nature nanotechnology5, 722 (2010)

  16. [24]

    S. Deb, W. Cao, N. Raab, K. Watanabe, T. Taniguchi, M. Goldstein, L. Kronik, M. Urbakh, O. Hod, and M. Ben Shalom, Cumulative polarization in conductive interfacial ferroelectrics, Nature612, 465 (2022)

  17. [25]

    X. Zhou, T. Dierke, M. Wu, S. You, K. G¨ otz, T. Unruh, P. Pelz, J. Will, J. Maultzsch, and E. Spiecker, Identifica- tion of polytypism and their dislocations in bilayer mos2 using correlative transmission electron microscopy and raman spectroscopy, npj 2D Materials and Applic...

  18. [26]

    J. He, K. Hummer, and C. Franchini, Stacking effects on the electronic and optical properties of bilayer transition metal dichalcogenides mos 2, mose 2, ws 2, and wse 2, Physical Review B89, 075409 (2014)

  19. [27]

    R. T. Sam, T. Umakoshi, and P. Verma, Probing stacking configurations in a few layered mos2 by low frequency raman spectroscopy, Scientific Reports10, 21227 (2020)

  20. [28]

    Van Baren, G

    J. Van Baren, G. Ye, J.-A. Yan, Z. Ye, P. Rezaie, P. Yu, Z. Liu, R. He, and C. H. Lui, Stacking-dependent inter- layer phonons in 3r and 2h mos2, 2D Materials6, 025022 (2019)

  21. [29]

    X. Wang, H. Shen, Y. Chen, G. Wu, P. Wang, H. Xia, T. Lin, P. Zhou, W. Hu, X. Meng, et al., Multimech- anism synergistic photodetectors with ultrabroad spec- trum response from 375 nm to 10µm, Advanced science 6, 1901050 (2019)

  22. [30]

    Liang, D

    J. Liang, D. Yang, J. Wu, Y. Xiao, K. Watanabe, T. Taniguchi, J. I. Dadap, and Z. Ye, Resolving polar- ization switching pathways of sliding ferroelectricity in trilayer 3r-mos2, Nature Nanotechnology20, 500 (2025). 10

  23. [31]

    D. Yang, J. Liang, J. Wu, Y. Xiao, J. I. Dadap, K. Watanabe, T. Taniguchi, and Z. Ye, Non-volatile elec- trical polarization switching via domain wall release in 3r- mos2 bilayer, Nature Communications15, 1389 (2024)

  24. [32]

    Wu and J

    M. Wu and J. Li, Sliding ferroelectricity in 2d van der waals materials: Related physics and future opportuni- ties, Proceedings of the National Academy of Sciences 118, e2115703118 (2021)

  25. [33]

    K. Roy, T. Ahmed, H. Dubey, T. P. Sai, R. Kashid, S. Maliakal, K. Hsieh, S. Shamim, and A. Ghosh, Number-resolved single-photon detection with ultralow noise van der waals hybrid, Advanced Materials30, 1704412 (2018)

  26. [34]

    Y. Xu, Y. Wang, C. Zhang, H. Wu, C. Tan, G. Hu, and Z. Wang, The role of trap states in mos 2-based photode- tectors, Nanoscale17, 9245 (2025)

  27. [35]

    Gao and L

    L. Gao and L. Bellaiche, Large photoinduced tuning of ferroelectricity in sliding ferroelectrics, Physical Review Letters133, 196801 (2024)

  28. [36]

    A. M. Z. Tan, C. Freysoldt, and R. G. Hennig, Stability of charged sulfur vacancies in 2d and bulk mos 2 from plane-wave density functional theory with electrostatic corrections, Physical Review Materials4, 064004 (2020)

  29. [37]

    S. Zhou, S. Wang, H. Li, W. Xu, C. Gong, J. C. Gross- man, and J. H. Warner, Atomic structure and dynamics of defects in 2d mos2 bilayers, ACS omega2, 3315 (2017)

Pith tools

Reviewed August 11, 2026 · model on record in the stance chip above.