Pith. sign in

REVIEW

Dynamic coupling between particle-in-cell and atomistic simulations

Not yet reviewed by Pith; the record is open.

This paper has not been read by Pith yet. Machine review is queued; the pith claim, tier, and objections will appear here once it completes.

SPECIMEN: schema-true, not a live event

T0 review · schema-true

One-sentence machine reading of the paper's core claim.

pith:XXXXXXXX · record.json · timestamp

arxiv 1906.08125 v2 pith:R44I4SJX submitted 2019-06-19 cs.CE

Dynamic coupling between particle-in-cell and atomistic simulations

classification cs.CE
keywords evaporationfieldmethodrunawaycomparisonemittershighintensive
verification ladder T0 review T1 audit T2 compute T3 formal T4 reserved
0 comments
read the original abstract

We propose a method to directly couple molecular dynamics, finite element method and particle-in-cell techniques to simulate metal surface response to high electric fields. We use this method to simulate the evolution of a field emitting tip under thermal runaway by fully including the 3D space-charge effects. We also present a comparison of the runaway process between the two tip geometries of different widths. The results show with high statistical significance that in case of sufficiently narrow field emitters, the thermal runaway occurs in cycles where intensive neutral evaporation alternates with the cooling periods. The comparison with previous works shows, that the evaporation rate in the regime of intensive evaporation is sufficient to ignite a plasma arc above the simulated field emitters.

discussion (0)

Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.