Ultrasonic Defect Modification in Irradiated Silicon

It is shown for the first time, that room temperature Ultrasonic Defect Manipulation (UDM) can significantly reduce the concentration of radiation defects in high resistivity silicon. Secondary Ion Mass Spectroscopy revealed that oxygen- and hydrogen- related chemical reactions in silicon are likely to occur under UDM at room temperature. Ultrasonically stimulated chemical reactions in solids can be an important source of energy, which is required for UDM.