pith:HFTPFD26
Modelling the Impact of Device Imperfections on Electron Shuttling in SiMOS devices
Raising confinement in SiMOS devices restores reliable conveyor-belt electron shuttling despite fabrication imperfections.
arxiv:2512.03853 v3 · 2025-12-03 · quant-ph · cond-mat.mes-hall
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Claims
Increasing the confinement restores conveyor-belt operation, which we find to be robust against interface roughness, gate misalignment, and charge defects buried in the oxide. However, our results indicate that defects located at the Si/SiO2-interface can induce considerable orbital excitation. For lower conveyor gate biases, positive defects in the transport channel can even capture passing electrons.
The 3D numerical solutions to the Poisson and time-dependent Schrödinger equations, together with the chosen models of roughness and defects, accurately represent real SiMOS device behavior without significant discretization or modeling errors.
3D simulations show that high confinement restores robust conveyor-belt shuttling in SiMOS devices despite roughness and buried defects, but Si/SiO2 interface defects cause orbital excitation and can trap electrons at low biases.
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| First computed | 2026-06-25T01:17:48.078349Z |
|---|---|
| Builder | pith-number-builder-2026-05-17-v1 |
| Signature | Pith Ed25519
(pith-v1-2026-05) · public key |
| Schema | pith-number/v1.0 |
Canonical hash
3966f28f5e178384a0e8940599058397d1634ef172cd585c00828e7199dd1470
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curl -sH 'Accept: application/ld+json' https://pith.science/pith/HFTPFD26C6BYJIHISQCZSBMDS7 \
| jq -c '.canonical_record' \
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Canonical record JSON
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