Accreting black holes contribute 40-60% of the mean Hα intensity and 60-80% of the mean He II intensity at cosmic noon in LIM, dominating the shot-noise term and boosting small-scale power.
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3 Pith papers cite this work. Polarity classification is still indexing.
3
Pith papers citing it
years
2026 3verdicts
UNVERDICTED 3representative citing papers
Optimizing electron-beam lithography via smaller beam step size and avoiding main-field stitching reduces random and systematic frequency scatter four-fold in superconducting microstrip resonators.
Simulations from COSMOS2020 show masking recovers [CII] above 300 GHz in ideal conditions but noise prevents useful S/N until near the end of 2000-hour observations.
citing papers explorer
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Signatures of Accreting Black Holes in Line Intensity Mapping
Accreting black holes contribute 40-60% of the mean Hα intensity and 60-80% of the mean He II intensity at cosmic noon in LIM, dominating the shot-noise term and boosting small-scale power.
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Enhanced electron-beam lithography to reduce the frequency scatter of 200-400 GHz superconducting microstrip resonators for on-chip filterbank spectrometers
Optimizing electron-beam lithography via smaller beam step size and avoiding main-field stitching reduces random and systematic frequency scatter four-fold in superconducting microstrip resonators.
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Testing masking effectiveness using multi-line image cubes based on COSMOS2020 for [CII] line intensity mapping at $z_{[CII]} > 3.5$
Simulations from COSMOS2020 show masking recovers [CII] above 300 GHz in ideal conditions but noise prevents useful S/N until near the end of 2000-hour observations.