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Reference changes · DOI

Corrigendum to: “Optical, structural and composition properties of silicon nitride films deposited by reactive radio-frequency sputtering, low pressure and plasma-enhanced chemical vapor deposition” [Thin Solid Films (2023) 139568]

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Correction Crossref 2 open · 2 total · 0 disputed
DOI
10.1016/j.tsf.2022.139568
Notice DOI
10.1016/j.tsf.2023.140124
Event date
2023-11-28
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01One-hop citing occurrences

Correction Open
Cryogenic Graphene-Based Phase Modulators for Quantum Information Processing

ref [56] · 2605.00112 · notice #7704 · dispute

Raw extraction · citation context

"Photonic quantum information pro- cessing: A concise review". In:Applied Physics Reviews6.4 (2019), p. 041303.doi:10.1063/1.5115814. [55] S. Xie, S. Veilleux, and M. Dagenais. "On-Chip High Extinction Ratio Single-Stage Mach-Zehnder Interferometer Based on Multimode Inter- ferometer". In:IEEE Photonics Journal14.4 (2022), p. 2237906.doi: 10.1109/JPHOT.2022.3183214. [56] L. Y. Beliaev et al. "Optical, structural and compositional properties of silicon nitride films deposited by reactive radio-frequency sputtering, low pressure and plasma-enhanced chemical vapor deposition". In:Thin Solid Films763 (2022), p. 139568.doi:10.1016/j.tsf.2022.139568. [57] D. I. Yakubovsky et al. "Optical constants and structural properties
Correction Open
Material selection for mid-infrared thin-film coatings and windows

ref [38] · 2605.29079 · notice #7705 · dispute

Raw extraction · bibliography line

L. Y. Beliaev, E. Shkondin, A. V. Lavrinenko, and O. Takayama, “Optical, structural and composition properties of silicon nitride films deposited by reactive radio-frequency sputtering, low pressure and plasma-enhanced chemical vapor deposition,” Thin Solid Films, vol. 763, pp. 139568, 2022, doi: 10.1016/j.tsf.2022.139568

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