The effect of p-type doping on the oxidation of H-Si(111) studied by second-harmonic generation
classification
❄️ cond-mat.mtrl-sci
physics.chem-phphysics.optics
keywords
bondsdopinggenerationoxidationsecond-harmonicatomicbackboron
read the original abstract
Atomic force microscopy and second-harmonic generation data show that boron doping enhances the rate of oxidation of H-terminated silicon. Holes cause a greater increase in the reactivity of the Si-H up bonds than that of the Si-Si back bonds.
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