Growth and Electrical Characterization of 2D Layered MoS2/SiC Heterojunctions

The growth and electrical characterization of a heterojunction formed between 2D layered p-MoS2 and nitrogen-doped 4H-SiC is reported. Direct growth of p-type MoS2 films on SiC was demonstrated using chemical vapor deposition, and the MoS2 films were found to be crystalline based on x-ray diffraction measurements. The resulting heterojunction was found to display rectification and current-voltage characteristics consistent with a p-n junction diode. Capacitance voltage measurements were used to determine the built-in voltage for the p-MoS2/n-SiC heterojunction p-n diode. The demonstration of heterogeneous material integration between 2D layered semiconductors and 3D SiC enables a new class of heterostructures.