Single-Walled Carbon Nanotubes as Shadow Masks for Nanogap Fabrication
classification
❄️ cond-mat.mes-hall
cond-mat.mtrl-sci
keywords
carboncurrent-voltagedevicesmasksnanotubesshadowsingle-walledcharacteristic
read the original abstract
We describe a technique for fabricating nanometer-scale gaps in Pt wires on insulating substrates, using individual single-walled carbon nanotubes as shadow masks during metal deposition. More than 80% of the devices display current-voltage dependencies characteristic of direct electron tunneling. Fits to the current-voltage data yield gap widths in the 0.8-2.3 nm range for these devices, dimensions that are well suited for single-molecule transport measurements.
This paper has not been read by Pith yet.
discussion (0)
Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.