High coherence fluxonium manufactured with a wafer-scale uniformity process

Fluxonium qubits are recognized for their high coherence times and high operation fidelities, attributed to their unique design incorporating a superinductor, which is typically implemented using an array of over 100 Josephson junctions. However, this complexity poses significant fabrication challenges, particularly in achieving high yield and junction uniformity with traditional methods. Here, we introduce an overlap process for Josephson junction fabrication that achieves nearly 100% yield and maintains uniformity across a 2-inch wafer with less than 5% variation for the phase slip junction and less than 2% for the entire junction array. We use a compact junction array design that achieves state-of-the-art dielectric loss tangents and flux noise levels, as confirmed by multiple devices. This enables fluxonium qubits to reach energy relaxation times exceeding 1 millisecond at the flux frustration point. This work paves the way for scalable high coherence fluxonium processors using CMOS-compatible processes, marking a significant step towards practical quantum computing.