Spin transistor built on 2D van der Waals heterostructures

Spin transistors (whose on-off operation is achieved by electric-field-controlled spin orientation 1), if realized, can revolutionize modern electronics through the implementation of a faster and a more energy-efficient performance as well as non-volatile data storage 2, 3. The original proposal by Datta and Das 1 that relies on electric-field-controlled spin precession in a semiconductor channel faces significant challenges including inefficient spin injection, spin relaxation and spread of the spin precession angle 4, 5. Recent demonstration of electric-field switching of magnetic order 6-8 and spin filtering 9-12 in two-dimensional magnetic insulator CrI3 has inspired a new operational principle for spin transistors. Here we demonstrate spin field-effect transistors based on dual-gated graphene/CrI3 tunnel junctions. These devices show an ambipolar transistor behavior and tunnel magnetoresistance widely tunable by gating when the CrI3 magnetic tunnel barrier undergoes an antiferromagnetic-ferromagnetic spin-flip transition. Under a constant magnetic bias in the vicinity of the spin-flip transition, the gate voltage can repeatedly alter the device between a high and a low conductance state with a large hysteresis. This new spin transistor concept based on the electric-field-controlled spin-flip transition in the magnetic tunnel barrier is immune to interface imperfections and allows spin injection, control and detection in a single device.