Not yet reviewed by Pith; the record is open.

Ruthenium thin films can serve as protective caps for multi-layer extreme ultraviolet mirrors exposed to atomic hydrogen. Hydrogen permeation through ruthenium is problematic as it leads to blisters on the mirrors. H has been shown to exhibit low solubility in bulk Ru, and rapidly diffuses in and out of Ru. Therefore, the underlying mechanisms of the blistering effect remains unknown. This work makes use of reactive molecular dynamics simulations to study the influence of imperfections in a Ru film on the behaviour of H. For the Ru/H system, a ReaxFF force field was parametrised which reproduces structures and energies obtained from quantum-mechanical calculations. Molecular dynamics simulations have been performed with the newly-developed force field, to study the effect of tilt and twist grain boundaries on the overall diffusion behaviour of H in Ru. Our simulations show the tilt and twist grain boundaries provide energetically favourable sites for hydrogen atoms and act as sinks and highways for H. They therefore block H transport across their planes, and favour diffusion along their planes. This results in the accumulation of hydrogen at the grain boundaries. The strong effect of the grain boundaries on the hydrogen diffusion suggests tailoring the morphology of ruthenium thin films as a means to curb the rate of hydrogen permeation.