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Characterization of the Hamamatsu VUV4 MPPCs for nEXO
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Characterization of the Hamamatsu VUV4 MPPCs for nEXO
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In this paper we report on the characterization of the Hamamatsu VUV4 (S/N: S13370-6152) Vacuum Ultra-Violet (VUV) sensitive Silicon Photo-Multipliers (SiPMs) as part of the development of a solution for the detection of liquid xenon scintillation light for the nEXO experiment. Various SiPM features, such as: dark noise, gain, correlated avalanches, direct crosstalk and Photon Detection Efficiency (PDE) were measured in a dedicated setup at TRIUMF. SiPMs were characterized in the range $163 \text{ } \text{K} \leq \text{T}\leq 233 \text{ } \text{K}$. At an over voltage of $3.1\pm0.2$ V and at $\text{T}=163 \text{ }\text{K}$ we report a number of Correlated Avalanches (CAs) per pulse in the $1 \upmu\text{s}$ interval following the trigger pulse of $0.161\pm0.005$. At the same settings the Dark-Noise (DN) rate is $0.137\pm0.002 \text{ Hz/mm}^{2}$. Both the number of CAs and the DN rate are within nEXO specifications. The PDE of the Hamamatsu VUV4 was measured for two different devices at $\text{T}=233 \text{ }\text{K}$ for a mean wavelength of $189\pm7\text{ nm}$. At $3.6\pm0.2$ V and $3.5\pm0.2$ V of over voltage we report a PDE of $13.4\pm2.6\text{ }\%$ and $11\pm2\%$, corresponding to a saturation PDE of $14.8\pm2.8\text{ }\%$ and $12.2\pm2.3\%$, respectively. Both values are well below the $24\text{ }\%$ saturation PDE advertised by Hamamatsu. More generally, the second device tested at $3.5\pm0.2$ V of over voltage is below the nEXO PDE requirement. The first one instead yields a PDE that is marginally close to meeting the nEXO specifications. This suggests that with modest improvements the Hamamatsu VUV4 MPPCs could be considered as an alternative to the FBK-LF SiPMs for the final design of the nEXO detector.
Forward citations
Cited by 2 Pith papers
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Performance of FBK VUV-HD3 and HPK VUV4 SiPMs in the Light-only Liquid Xenon (LoLX) Detector
In liquid xenon, HPK VUV4 SiPMs detect 33-38% less light than FBK VUV-HD3 devices; the gap matches data only after an angular/wavelength-dependent PDE model that includes surface shadowing is used in the optical simulation.
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Performance of FBK VUV-HD3 and HPK VUV4 SiPMs in the Light-only Liquid Xenon (LoLX) Detector
In-situ comparison in liquid xenon finds HPK VUV4 SiPMs detect 33–38% less scintillation light than FBK VUV-HD3 SiPMs, attributed to surface shadowing at oblique photon incidence.
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