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High-Performance Carbon Nanotube Transistors on SrTiO3/Si Substrates

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arxiv cond-mat/0401591 v1 pith:TSD7HIXO submitted 2004-01-28 cond-mat.mes-hall

High-Performance Carbon Nanotube Transistors on SrTiO3/Si Substrates

classification cond-mat.mes-hall
keywords srtio3gatebeencarbondielectrichigh-kappahigh-performanceincreased
verification ladder T0 review T1 audit T2 compute T3 formal T4 reserved
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Single-walled carbon nanotubes (SWNTs) have been grown via chemical vapor deposition on high-kappa dielectric SrTiO3/Si substrates, and high-performance semiconducting SWNT field-effect transistors have been fabricated using the thin SrTiO3 as gate dielectric and Si as gate electrode. The transconductance per channel width is 8900 S/m. The high transconductance cannot be explained by the increased gate capacitance; it is proposed that the increased electric field at the nanotube-electrode interface due to the high-kappa SrTiO3 decreases or eliminates the nanotube-electrode Schottky barrier.

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