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arxiv 2307.01604 v1 pith:VOOHBMXO submitted 2023-07-04 cond-mat.mtrl-sci

Electronic structure of the Ge/Si(105) hetero-interface

classification cond-mat.mtrl-sci
keywords electronicstructuresurfacefilmhetero-interfacerebonded-stepagreementanalysis
verification ladder T0 review T1 audit T2 compute T3 formal T4 reserved
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Thin Ge layers deposited on Si(105) form a stable single-domain film structure with large terraces and rebonded-step surface termination, thus realizing an extended and ordered Ge/Si planar hetero-junction. At the coverage of four Ge monolayers angle-resolved photoemission spectroscopy reveals the presence of two-dimensional surface and film bands displaying energy-momentum dispersion compatible with the 5x4 periodicity of the system. The good agreement between experiment and first-principles electronic structure calculations confirms the validity of the rebonded-step structural model. The direct observation of surface features within 1 eV below the valence band maximum corroborates previously reported analysis of the electronic and optical behavior of the Ge/Si hetero-interface.

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