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3D-Integrated Superconducting qubits: CMOS-Compatible, Wafer-Scale Processing for Flip-Chip Architectures
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In this article, we present a technology development of a superconducting qubit device 3D-integrated by flip-chip-bonding and processed following CMOS fabrication standards and contamination rules on 200 mm wafers. We present the utilized proof-of-concept chip designs for qubit- and carrier chip, as well as the respective front-end and back-end fabrication techniques. In characterization of the newly developed microbump technology based on metallized KOH-etched Si-islands, we observe a superconducting transition of the used metal stacks and radio frequency (RF) signal transfer through the bump connection with negligible attenuation. In time-domain spectroscopy of the qubits we find high yield qubit excitation with energy relaxation times of up to 15 us.
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Stability studies on subtractively-fabricated CMOS-compatible superconducting transmon qubits
Subtractively-fabricated CMOS-compatible transmon qubits show T1 stability on par with lift-off qubits, with a universal σT1 ∝ ⟨T1⟩^{3/2} scaling and a few-percent junction aging over a year.
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