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Strongly Enhanced Thermal Stability of Crystalline Organic Thin Films Induced by Aluminum Oxide Capping Layers

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arxiv cond-mat/0407588 v1 pith:AU4WJHTR submitted 2004-07-22 cond-mat.mtrl-sci

Strongly Enhanced Thermal Stability of Crystalline Organic Thin Films Induced by Aluminum Oxide Capping Layers

classification cond-mat.mtrl-sci
keywords filmsorganicthermalaluminumlayersoxidestabilitycapping
verification ladder T0 review T1 audit T2 compute T3 formal T4 reserved
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We show that the thermal stability of thin films of the organic semiconductor diindenoperylene (DIP) can be strongly enhanced by aluminum oxide capping layers. By thermal desorption spectroscopy and in-situ X-ray diffraction we demonstrate that organic films do not only stay on the substrate, but even remain crystalline up to 460C, i.e. 270 deg. above their desorption point for uncapped films (190C). We argue that this strong enhancement of the thermal stability compared to uncapped and also metal-capped organic layers is related to the very weak diffusion of aluminum oxide and the structurally well-defined as-grown interfaces. We discuss possible mechanisms for the eventual breakdown at high temperatures.

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