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Dual-Interrelated Diffusion Model for Few-Shot Anomaly Image Generation

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arxiv 2408.13509 v3 pith:PILAXLZT submitted 2024-08-24 cs.CV

classification cs.CV
keywords anomalyimagegenerationmodelfew-shotgenerateddiffusiondiversity
verification ladder T0 review T1 audit T2 compute T3 formal
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The performance of anomaly inspection in industrial manufacturing is constrained by the scarcity of anomaly data. To overcome this challenge, researchers have started employing anomaly generation approaches to augment the anomaly dataset. However, existing anomaly generation methods suffer from limited diversity in the generated anomalies and struggle to achieve a seamless blending of this anomaly with the original image. Moreover, the generated mask is usually not aligned with the generated anomaly. In this paper, we overcome these challenges from a new perspective, simultaneously generating a pair of the overall image and the corresponding anomaly part. We propose DualAnoDiff, a novel diffusion-based few-shot anomaly image generation model, which can generate diverse and realistic anomaly images by using a dual-interrelated diffusion model, where one of them is employed to generate the whole image while the other one generates the anomaly part. Moreover, we extract background and shape information to mitigate the distortion and blurriness phenomenon in few-shot image generation. Extensive experiments demonstrate the superiority of our proposed model over state-of-the-art methods in terms of diversity, realism and the accuracy of mask. Overall, our approach significantly improves the performance of downstream anomaly inspection tasks, including anomaly detection, anomaly localization, and anomaly classification tasks.

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Cited by 4 Pith papers

Reviewed papers in the Pith corpus that reference this work. Sorted by Pith novelty score. Full citation record

  1. STAGE: Segmentation-oriented Industrial Anomaly Synthesis via Graded Diffusion with Explicit Mask Alignment

    cs.CV 2025-09 conditional novelty 6.0 of 10

    A graded diffusion framework with explicit mask alignment synthesizes realistic, mask-aligned industrial anomalies and improves downstream anomaly segmentation on MVTec and BTAD.

  2. Generate Aligned Anomaly: Region-Guided Few-Shot Anomaly Image-Mask Pair Synthesis for Industrial Inspection

    cs.CV 2025-07 conditional novelty 6.0 of 10

    GAA synthesizes aligned anomaly image-mask pairs from few examples using decomposed concept embeddings and region-guided masks, improving downstream anomaly localization and classification on MVTec AD and LOCO.

  3. ICME 2026 Grand Challenge on Cross-Scenario Defect Detection and Fine-Grained Severity Grading for High-Precision Manufacturing

    cs.CV 2026-07 accept novelty 5.0 of 10

    A new industrial wafer-defect challenge and dataset for cross-scenario instance detection and ordinal severity grading, with leaderboards from 21 finalist teams.

  4. A Comprehensive Survey for Real-World Industrial Defect Detection: Challenges, Approaches, and Prospects

    cs.CV 2025-07 conditional novelty 3.0 of 10

    A broad survey of industrial defect detection that structures the field by closed-set vs open-set and 2D vs 3D methods, with an emphasis on the rise of open-set anomaly detection.

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