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Epitaxial aluminum layer on antimonide heterostructures for exploring Josephson junction effects

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arxiv 2410.06085 v2 pith:J4TI2AP2 submitted 2024-10-08 cond-mat.mtrl-sci cond-mat.mes-hallcond-mat.supr-con

classification cond-mat.mtrl-scicond-mat.mes-hallcond-mat.supr-con
keywords epi-alantimonideheterostructuresjosephsonaluminumeffectsjunctionresults
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abstract

In this article, we present results of our recent work of epitaxially-grown aluminum (epi-Al) on antimonide heterostructures, where the epi-Al thin film is grown at either room temperature or below zero $^o$C. A sharp superconducting transition at $T \sim 1.3$ K is observed in these epi-Al films. We further show that supercurrent states are realized in Josephson junctions fabricated in the epi-Al/antimonide heterostructures with mobility $\mu \sim 1.0 \times 10^6$ cm$^2$/Vs. These results clearly demonstrate we have achieved growing high-quality epi-Al/antimonide heterostructures, a promising platform for the exploration of Josephson junction effects for quantum information science and microelectronics applications.

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