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High-impedance resonators for strong coupling to an electron on helium

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arxiv 2410.19592 v2 pith:RITOU3K6 submitted 2024-10-25 quant-ph cond-mat.mes-hall

classification quant-phcond-mat.mes-hall
keywords couplingresonatorsheliumelectronsresonatorstrongelectronhigh-impedance
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abstract

The in-plane motion of an electron on helium can couple to superconducting microwave resonators via electrical dipole coupling, offering a robust and rapid readout scheme. In previous efforts, microwave resonator designs for electrons on helium have lacked the coupling strength to reach the strong coupling regime, where coherent quantum effects outlast both electron and resonator decoherence rates. High-impedance superconducting microwave resonators offer a path to strong coupling, but integrating such resonators with electrons on helium remains an outstanding challenge. Here, we introduce a high-impedance resonator design compatible with strong coupling to electrons on helium. We fabricate and measure titanium nitride resonators with median internal quality factors of $3.9\times 10^5$ and average impedance of 2.5 k$\Omega$, promising a seven-fold increase in coupling strength compared with standard 50$\Omega$ resonators. Additionally, we develop a simplified resonator model from the capacitance matrix and sheet inductance that accurately predicts the mode frequencies, significantly simplifying the design process of future resonators for investigating quantum effects with electrons on helium.

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Cited by 2 Pith papers

Reviewed papers in the Pith corpus that reference this work. Sorted by Pith novelty score. Full citation record

  1. Sensing and Control of Single Trapped Electrons Above 1 Kelvin

    quant-ph 2024-12 conditional novelty 6.0 of 10

    At 1.1 K, a superconducting resonator reads out the charge state of a trap holding as few as one electron on liquid helium, with frequency shifts consistent with a classical oscillator model.

  2. Implementation of scalable suspended superinductors

    quant-ph 2024-11 conditional novelty 6.0 of 10

    A selective etching process suspends Josephson junction arrays above the substrate, reducing parasitic capacitance by about 74% and increasing inductance by 87% in a fluxonium qubit, without degrading coherence.

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