Pith. sign in

REVIEW

Not yet reviewed by Pith; the record is open.

This paper has not been read by Pith yet. Machine review is queued; the pith claim, tier, and objections will appear here once it completes.

SPECIMEN: schema-true, not a live event

T0 review · schema-true

One-sentence machine reading of the paper's core claim.

pith:XXXXXXXX · record.json · timestamp

arxiv 2307.06477 v1 pith:EPVJEXZZ submitted 2023-07-12 cond-mat.mes-hall cond-mat.mtrl-sci

Surface-Confined Two-Dimensional Crystal Growth on a Monolayer

classification cond-mat.mes-hall cond-mat.mtrl-sci
keywords growthmaterialsmonolayerapproachcrystalcrystallinesurface-confinedtransport
verification ladder T0 review T1 audit T2 compute T3 formal T4 reserved
0 comments
read the original abstract

Conventional vapor deposition or epitaxial growth of two-dimensional (2D) materials and heterostructures is conducted in a large chamber in which masses transport from the source to the substrate. Here we report a chamber-free, on-chip approach for growing a 2D crystalline structures directly in a nanoscale surface-confined 2D space. The method is based on a surprising discovery of a rapid, long-distance, non-Fickian transport of a uniform layer of atomically thin palladium (Pd) on a monolayer crystal of tungsten ditelluride (WTe2), at temperatures well below the known melting points of all materials involved. The resulting nanoconfined growth realizes a controlled formation of a stable new 2D crystalline material, Pd7WTe2 , when the monolayer seed is either free-standing or fully encapsulated in a van der Waals stack. The approach is generalizable and highly compatible with nanodevice fabrication, promising to expand the library of 2D materials and their functionalities.

discussion (0)

Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.