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Suppression of quasiparticle poisoning in transmon qubits by gap engineering

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arxiv 2309.02655 v3 pith:DFTQOYKU submitted 2023-09-06 quant-ph cond-mat.mes-hallcond-mat.supr-con

Suppression of quasiparticle poisoning in transmon qubits by gap engineering

classification quant-ph cond-mat.mes-hallcond-mat.supr-con
keywords tunnelingengineeringqubitssuperconductingacrossal-basedjosephsonjunctions
verification ladder T0 review T1 audit T2 compute T3 formal T4 reserved
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The performance of various superconducting devices operating at ultra-low temperatures is impaired by the presence of non-equilibrium quasiparticles. Inelastic quasiparticle (QP) tunneling across Josephson junctions in superconducting qubits results in decoherence and spurious excitations and, notably, can trigger correlated errors that severely impede quantum error correction. In this work, we use "gap engineering" to suppress the tunneling of low-energy quasiparticles in Al-based transmon qubits, a leading building block for superconducting quantum processors. By implementing potential barriers for QP, we strongly suppress QP tunneling across the junction and preserve charge parity for over $10^3$ seconds. The suppression of QP tunneling also results in a reduction in the qubit energy relaxation rates. The demonstrated approach to gap engineering can be easily implemented in all Al-based circuits with Josephson junctions.

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  1. On-chip stencil lithography for superconducting qubits

    quant-ph 2025-07 unverdicted novelty 6.0

    An on-chip SiO2/Si3N4 stencil lithography mask enables shadow evaporation of Al Josephson junctions, demonstrated with transmon qubits achieving average T1 of 75 μs.